Invited Speaker: Zhang Xianmin
Northeastern University Key Laboratory of Materials Anisotropy and Texture, Ministry of Education
Invited Speaker: Xiang Jinjuan
Engineer at the Institute of Microelectronics, Chinese Academy of Sciences
Pan Xingang, Shanghai Bokang Fine Chemical Co., Ltd.
Title of the Report: Polymer Materials in Electron-Beam Photoresists Brief Introduction to the Report: In microelectronic fabrication and nanofabrication processes, electron-beam photoresists are among the most commonly used high-resolution patterning materials for creating graphic masks. The key material in electron-beam photoresists is organic polymers. This paper discusses various polymer materials used in electron-beam photoresists, covering aspects such as the monomer structures of these polymers, their different compositions, molecular weight ranges and distributions, as well as their characterization within electron-beam photoresist systems. It also elucidates how these factors influence the performance of electron-beam photoresists. Furthermore, changes in the lithographic process play a crucial role in determining the behavior of polymer materials during lithography. Finally, the author provides a list of examples.
Engineer at the Leading Process R&D Center, Institute of Microelectronics, Chinese Academy of Sciences
Researcher at the Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
Professor at Jiangnan University
Professor at Tsinghua University
Invited speaker: Yang Guoqiang
Deputy Director of the Institute of Chemistry, Chinese Academy of Sciences
Professor at Peking University and Doctoral Supervisor
Inviting keynote speaker Pan Jiaoqing
Researcher at the Institute of Semiconductors, Chinese Academy of Sciences; Doctoral Supervisor
Professor, Doctoral Supervisor, and Head of the Department, School of Chemical Engineering, Harbin Institute of Technology
Director of the Research Institute for Color Dynamic Electronic Paper Display Technology, South China Normal University
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