Membrane-removing solution

Hubei Xingfu Electronic Materials Co., Ltd.

Tetramethylammonium hydroxide (TMAH, 25% concentration)

Hubei Xingfu Electronic Materials Co., Ltd.

Aluminum etching solution

Recommendation rating: ★★★★★ Hubei Xingfu Electronic Materials Co., Ltd.

Sulfuric acid (H2SO4, 96% concentration)

Recommendation rating: ★★★★ Hubei Xingfu Electronic Materials Co., Ltd.

Phosphoric acid (H3PO4, 86% concentration)

Recommendation rating: ★★★★★ Hubei Xingfu Electronic Materials Co., Ltd.

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