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The 2019 China Semiconductor Materials Innovation and Development Conference was successfully held in Ningbo.

The 2019 China Semiconductor Materials Innovation and Development Conference was successfully held in Ningbo, with over 100 participating companies and nearly 400 attendees.

The 2019 China Semiconductor Materials Innovation and Development Conference was successfully held in Ningbo.

The 2019 China Semiconductor Materials Innovation and Development Conference was successfully held in Ningbo, with over 100 participating companies and nearly 400 attendees.

Xingfa Group’s Electronic Chemicals Division Adds Another “Core” Material—Electronics-Grade Hydrofluoric Acid

Xingfa Group has been deeply engaged in the field of electronic chemicals for 10 years, and its industrial development has been steadily improving. Products such as electronic-grade phosphoric acid, electronic-grade sulfuric acid, and functional chemicals have now achieved import substitution.

The “China Materials Conference 2019” Advanced Microelectronics and Optoelectronics Materials Sub-Forum Was Successfully Held.

From July 10 to 14, 2019, the "China Materials Conference 2019" was grandly held at the China West International Expo City in Chengdu, Sichuan Province.

Notice of Approval for Group Standard Development

To all relevant organizations: Following review by the Standards Committee of the Integrated Circuit Materials Industry Technology Innovation Alliance (hereafter referred to as ICMTIA), we have decided to initiate the development of the following six group standards: 2019-10LX-ICMTIA “Solid ArF Photoresist Monomers for Integrated Circuits”; 2019-11LX-ICMTIA “Liquid ArF Photoresist Monomers for Integrated Circuits”; 2019-12LX-ICMTIA “ArF Dry Photoresists for Integrated Circuits”; 2019-13LX-ICMTIA “ArF Immersion Photoresists for Integrated Circuits”; 2019-14L

Notice of Approval for Group Standard Development

To All Relevant Organizations: Following review by the Standards Committee of the Integrated Circuit Materials Industry Technology Innovation Alliance (hereinafter referred to as ICMTIA), we have decided to initiate the development of the following six group standards: 2019-10LX-ICMTIA: “Solid ArF Photoresist Monomers for Integrated Circuits” 2019-11LX-ICMTIA: “Liquid ArF Photoresist Monomers for Integrated Circuits” 2019-12LX-ICMTIA: “Dry ArF Photoresists for Integrated Circuits” 2019-13LX-ICMTIA: “Immersion ArF Photoresists for Integrated Circuits” 2019-14LX-ICMTIA: “Methods for Testing Photoresists Used in Integrated Circuits” 2019-15LX-ICMTIA: “300mm Silicon Epitaxial Wafers for Integrated Circuits” The project management authority is the ICMTIA Standards Committee. We welcome research institutions, relevant enterprises, end-users, and other organizations with expertise in these areas to join the drafting and development of these standards. Interested parties are invited to contact the Standards Committee Office. If any organization or individual has objections to the above-mentioned standard projects, please submit your feedback to the Standards Committee Office within 10 working days from the date of this announcement. Contact: Liu Yan Phone: 010-82358415 Email: liuyan@icmtia.com Integrated Circuit Materials Industry Technology Innovation Alliance June 17, 2019

Announcement of Project Initiation for Group Standards 2019-10LX-ICMTIA ~ 2019-15LX-ICMTIA

To all relevant organizations: Following review by the Standards Committee of the Integrated Circuit Materials Industry Technology Innovation Alliance (hereinafter referred to as ICMTIA), we have decided to initiate the development of the following six group standards: 2019-10LX-ICMTIA “Solid ArF Photoresist Monomer for Integrated Circuits” and 2019-11LX-ICMTIA “Liquid ArF Photoresist Monomer for Integrated Circuits.”

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