Announcement of Project Initiation for Group Standards 2019-10LX-ICMTIA ~ 2019-15LX-ICMTIA

To all relevant organizations: Following review by the Standards Committee of the Integrated Circuit Materials Industry Technology Innovation Alliance (hereinafter referred to as ICMTIA), we have decided to initiate the development of the following six group standards: 2019-10LX-ICMTIA “Solid ArF Photoresist Monomer for Integrated Circuits” and 2019-11LX-ICMTIA “Liquid ArF Photoresist Monomer for Integrated Circuits.”

To all relevant units:

　　After review by the Standards Committee of the Integrated Circuit Materials Industry Technology Innovation Alliance (referred to as ICMTIA), it has been decided to initiate the development of the following six group standards:

　　2019-10LX-ICMTIA “Solid ArF Photoresist Monomer for Integrated Circuits”

　　2019-11LX-ICMTIA “Liquid ArF Photoresist Monomer for Integrated Circuits”

　　2019-12LX-ICMTIA “ArF Dry Photoresist for Integrated Circuits”

　　2019-13LX-ICMTIA “ArF Immersion Photoresist for Integrated Circuits”

　　2019-14LX-ICMTIA “Photolithographic Resist Testing Method for Integrated Circuits”

　　2019-15LX-ICMTIA “300mm Silicon Epitaxial Wafers for Integrated Circuits”

　　The project is managed by the ICMTIA Standards Committee. Research institutions, relevant enterprises, and user organizations that are interested in this standard are welcome to join the drafting and development process. Interested parties are requested to contact the Secretariat of the Standards Committee.

　　If any organization or individual has objections to the above-mentioned standard items, please submit your feedback to the Standards Committee Office within 10 working days from the date of this announcement.

　　Contact: Liu Yan
　　Phone: 010-82358415
　　Email: liuyan@icmtia.com

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