Hotspot Focus
From May 26 to 29, 2019, the China Planarization Technology Conference and the Cross-Strait Planarization Technology Symposium were successfully held at the Shanghai Institute of Microsystem and Information Technology of the Chinese Academy of Sciences. The conference was organized by the China Planarization Technology Alliance and hosted by the Shanghai Institute of Microsystem and Information Technology of the Chinese Academy of Sciences and Hebei University of Technology, with co-organizers including the Taiwan Planarization Application Technology Association, Shanghai Xin’anna Electronic Technology Co., Ltd., and Zhejiang Xinchuanna Electronic Technology Co., Ltd. It was guided by the Integrated Circuit Materials Industry Technology Innovation Alliance and the Shanghai Nanotechnology Association. The event aimed to promote exchanges and cooperation in planarization technology across the Taiwan Strait and advance China’s planarization technology.
On May 31, 2019, the first meeting of the Electronic Gases Workshop, hosted by the Materials Alliance and organized by Shanghai Zhengfan Technology Co., Ltd., was successfully held at the Zhengfan Technology Building in Shanghai.
From May 16 to 17, 2019, the “Supplier Quality Management Training,” jointly organized by the Integrated Circuit Materials Industry Technology Innovation Alliance and Yangtze Memory Technologies Co., Ltd., was held at the Hetai Hotel in Wuhan.
The “2019 China Semiconductor Materials Innovation and Development Conference” (hereinafter referred to as the “Conference”) will be held in Ningbo, China from September 10 to 11. The Conference cordially invites you to join us.
Announcement on Alliance Group Standards (No. 1)
In accordance with the “Regulations on the Administration of Group Standards” and the “Procedures for Developing Standards of the Integrated Circuit Materials Industry Technology Innovation Alliance,” and following review and approval by the Alliance Standards Committee, we hereby approve and release the following two group standards: T/ICMTIA1-2019 “Basic Specifications for Gases of the Integrated Circuit Materials Industry Technology Innovation Alliance” and T/ICMTIA2-2019 “Hydrogen Peroxide for Integrated Circuits.” These standards were published on April 17, 2019, and will take effect as of October 10, 2019. This is hereby announced. Appendix 1: Table of Contents for “Basic Specifications for Gases of the Integrated Circuit Materials Industry Technology Innovation Alliance” Appendix 2:
Announcement on Alliance Group Standards (No. 1)
In accordance with the “Regulations on the Administration of Group Standards” and the “Procedures for Developing Standards of the Integrated Circuit Materials Industry Technology Innovation Alliance,” and following review and approval by the Alliance Standards Committee, we hereby approve and release the following two group standards: T/ICMTIA1-2019 “Basic Specifications for Gases of the Integrated Circuit Materials Industry Technology Innovation Alliance” and T/ICMTIA2-2019 “Hydrogen Peroxide for Integrated Circuits.” These standards were published on April 17, 2019, and will take effect as of October 10, 2019. This is hereby announced. Appendix 1: Table of Contents for “Basic Specifications for Gases of the Integrated Circuit Materials Industry Technology Innovation Alliance” Appendix 2:
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