Introduction to the Global Photoresist Patent Analysis Report (2019 Edition)

Photoresist is the core material used in the photolithography process for integrated circuit manufacturing and is a key material for integrated circuit development that receives strong national support. Understanding the global patent landscape of photoresist R&D will greatly benefit the development of China’s photoresist industry. The “Global Photoresist Patent Analysis Report (2019 Edition)”—based on a globally renowned patent retrieval and analysis system—comprehensively searched the databases contained within the system for patents related to photoresist R&D worldwide, from the earliest searchable year of 1782 up to May 2019, and conducted a detailed and in-depth analysis covering the following five major aspects: an analysis of global photoresist R&D patents; a comparative overview of the total number of photoresist R&D patents across six major regions—Europe, the United States, Japan, South Korea, China, and Taiwan; an analysis of the patent status for different types of photoresists; an in-depth analysis of the patent status of the world’s top ten photoresist R&D companies; and an analysis of the patent status of photoresists in China. In this analysis, nearly 20 metrics—including the volume of patent applications, trends in patent applications, legal statuses of patents, geographic distribution of patents, distribution of patent holders, citation patterns among patent holders, trends in IPC classification of patent applications, core patent concepts, patent maps, technical field classification tables, core patent analyses, co-application patterns among patent holders, technological positioning of leading patent holders, and patent classification tables—were employed to conduct a comprehensive analysis of the patents, revealing highly valuable insights into this technological field. The report further elucidates the core technologies in the photoresist sector, analyzes the overall status of China’s photoresist R&D patents and the gap between China and other countries, and proposes recommendations for China’s global patent strategy in the photoresist field.
The “Global Photoresist Industry Patent Analysis Report” comprises a total of 974 pages, with 274 figures and 106 tables, and includes the full text of 8,065 photoresist patents.
    

Report Directory
Chapter 1: Preface 8
Chapter 2: Instructions on Patent Retrieval and Analysis Methods for Photolithographic Resist Development 12
2.1 Database Selection 12
2.2 Patent Search and Analysis Method 12
Chapter 3: Overall Analysis of Global Photolithography Resin R&D Patent Situation 13
3.1 Analysis of the Total Number of Photolithography Resin Patent Applications 13
3.2 Trend Analysis of Photolithography Resin Patent Applications 13
3.3 Analysis of the Legal Status of Photolithography Resin Patents 14
3.4 Analysis of the Distribution Areas of Photolithography Resin Patents 16
3.5 Analysis of the Distribution of Patent Holders 17
3.6 Analysis of Patent Owner Citation Status 19
3.7 Overall In-depth Analysis of the Patent Technology Background 21
3.7.1 Classification Table of Technical Fields 21
3.7.2 Technical Domain Analysis of the ORBIT System 22
3.7.3 Top Participant Technology Positioning 23
3.7.4 Patent Map 26
3.8 Summary of Global Photolithography Resin R&D Patent Status 28
Chapter 4: Comparative Overview of Patents in Europe, the U.S., Japan, South Korea, China, and Taiwan 29
4.1 Comparison of the Total Number of Photolithography Resin Patent Applications 29
4.2 Comparison of Patent Application Trends in Photoresist Development 29
4.3 Comparative Analysis of the Legal Status of Photolithography Resin Patents 32
4.4 Comparison of the Distribution of Countries Where Photolithography Patent Publications Are Disclosed 35
4.5 Analysis of the Photolithography Resin Patent Holders and Their Patent Citation Status 46
4.6 Overall In-depth Comparative Analysis of the Patent Technology Background 54
4.6.1 Patent Classification Table 55
4.6.2 Distribution of IPC Classifications by Application Year 62
4.6.3 Technical Positioning of Top Patent Holders 69
4.6.4 Patent Map 72
4.7 Comparison of the Overall Patent Situation in China, the U.S., Japan, Europe, South Korea, and Taiwan 77
Chapter 5: Analysis of Patent Status for Photoresist Classification 79
5.1 Patent Analysis of G and I Lines, and Broad-Spectrum UV Photoresists 79
5.1.1 Analysis of the Total Number of Photolithography Resin Patent Applications 79
5.1.2 Trend Analysis of Patent Applications 79
5.1.3 Analysis of Patent Legal Status 80
5.1.4 Analysis of Patent Distribution Areas 82
5.1.5 Analysis of Patent Owner Distribution 84
5.1.6 Comprehensive In-depth Analysis of the Patent Technology Background for UV Broadband, G-Line, and I-Line 86
5.1.7 Summary and Trend Forecast of UV Broadband, G-line, and I-line Technologies 110
5.2 Patent Analysis of 248nm Photoresist 111
5.2.1 Analysis of the Total Number of Photolithography Resin Patent Applications 111
5.2.2 Trend Analysis of Patent Applications 113
5.2.3 Analysis of Patent Legal Status 114
5.2.4 Analysis of Patent Distribution Areas 116
5.2.5 Analysis of Patent Owner Distribution 118
5.2.6 Comprehensive In-depth Analysis of the 248nm Patent Technology Background 120
5.2.7 Summary of 248nm Photoresist Technology and Forecast of Development Trends 219
5.3 193nm Photoresist Patent Analysis 221
5.3.1 Analysis of the Total Number of Photolithography Resin Patent Applications 221
5.3.2 Trend Analysis of Patent Applications 222
5.3.3 Analysis of Patent Legal Status 223
5.3.4 Analysis of Patent Distribution Areas 225
5.3.5 Analysis of Patent Owner Distribution 227
5.3.6 Overall In-depth Analysis of the 193nm Patent Technology Background 230
5.3.7 Summary of 193nm Photoresist Technology and Forecast of Development Trends 344
5.4 Anti-reflective coating for photoresist applications 346
5.4.1 Analysis of the Total Number of Patent Applications for Anti-Reflection Coatings Used in Combination with Photoresists 346
5.4.2 Trend Analysis of Patent Applications 347
5.4.3 Analysis of Patent Legal Status 347
5.4.4 Analysis of Patent Distribution Areas 350
5.4.5 Analysis of Patent Owner Distribution 352
5.4.6 Comprehensive In-depth Analysis of the Patent Technology Background for Anti-Reflection Coatings Used in Photolithography 354
5.4.7 Summary of Anti-Reflection Coating Technology for Photolithography and Forecast of Development Trends 389
Chapter 6: In-depth Analysis of the Patent Status of the World’s Top Ten Photoresist Development Companies 391
6.1 Tokyo Ohka Kogyo Co., Ltd. (TOK, TOKYO OHKA KOGYO) 391
6.1.1 Analysis of the Total Number of Photolithography Resin Patent Applications 391
6.1.2 Trend Analysis of Photolithography Resin Patent Applications 391
6.1.3 Analysis of the Legal Status of Photolithography Resin Patents 392
6.1.4 Analysis of the Regional Distribution of Photolithography Resin Patents 394
6.1.5 Comprehensive In-depth Analysis of the Photolithography Resist Patent Technology Background 396
6.1.6 Analysis of Core Patents for Photoresist 398
6.1.7 Summary of TOK Corporation’s Photoresist Patent Situation 442
6.2 Shin-Etsu Chemical Co., Ltd. 443
6.2.1 Analysis of the Total Number of Photolithography Resin Patent Applications 443
6.2.2 Trend Analysis of Photolithography Resin Patent Applications 443
6.2.3 Analysis of the Legal Status of Photolithography Resin Patents 444
6.2.4 Analysis of the Distribution Areas of Photolithography Resin Patents 446
6.2.5 Comprehensive In-depth Analysis of the Patent Technical Background of Photoresist 448
6.2.6 Analysis of Core Patents for Photoresist 450
6.2.7 Summary of Shin-Etsu Chemical Co., Ltd.’s Photoresist Patent Situation 500
6.3 Dow Chemical Company 500
6.3.1 Analysis of the Total Number of Photolithography Resin Patent Applications 500
6.3.2 Trend Analysis of Photolithography Resin Patent Applications 501
6.3.3 Analysis of the Legal Status of Photolithography Resin Patents 502
6.3.4 Analysis of the Distribution Areas of Photolithography Resin Patents 504
6.3.5 Comprehensive In-depth Analysis of the Patent Technical Background of Photoresist 506
6.3.6 Analysis of Core Patents for Photoresist 508
6.3.7 Summary of Dow Chemical’s Photoresist Patent Situation 538
6.4 Sumitomo Chemical Co., Ltd. 538
6.4.1 Analysis of the Total Number of Photolithography Resin Patent Applications 538
6.4.2 Trend Analysis of Photolithography Resin Patent Applications 539
6.4.3 Analysis of the Legal Status of Photolithography Resin Patents 540
6.4.4 Analysis of the Distribution Areas of Photolithography Resin Patents 542
6.4.5 Overall In-depth Analysis of the Photolithography Resist Patent Technology Background 544
6.4.6 Analysis of Core Patents for Photoresist 547
6.4.7 Summary of Photolithography Patent Status of Sumitomo Chemical Co., Ltd. 596
6.5 Fujifilm Co., Ltd. 597
6.5.1 Analysis of the Total Number of Photolithography Resin Patent Applications 597
6.5.2 Trend Analysis of Photolithography Resin Patent Applications 597
6.5.3 Analysis of the Legal Status of Photolithography Resin Patents 598
6.5.4 Analysis of the Distribution Areas of Photolithography Resin Patents 601
6.5.5 Comprehensive In-depth Analysis of the Patent Technical Background of Photoresist 602
6.5.6 Analysis of Core Patents for Photoresist 605
6.5.7 Summary of Fujifilm Holdings Corporation’s Photoresist Patent Situation 639
6.6 AZ ELECTRONIC MATERIAL (U.S.) 640
6.6.1 Analysis of the Total Number of Photolithography Resin Patent Applications 640
6.6.2 Trend Analysis of Photolithography Resin Patent Applications 640
6.6.3 Analysis of the Legal Status of Photolithography Resin Patents 641
6.6.4 Analysis of the Distribution Areas of Photolithography Resin Patents 643
6.6.5 Comprehensive In-depth Analysis of the Patent Technical Background of Photoresist 645
6.6.6 Analysis of Core Patents for Photoresist 647
6.6.7 Summary of Photolithographic Resin Patent Status for Anzhi Electronic Materials Co., Ltd. 667
6.7 Japan Synthetic Rubber Co., Ltd. (JSR) 668
6.7.1 Analysis of the Total Number of Photolithography Resin Patent Applications 668
6.7.2 Trend Analysis of Photolithography Resin Patent Applications 668
6.7.3 Analysis of the Legal Status of Photolithography Resin Patents 669
6.7.4 Analysis of the Regional Distribution of Photolithography Resin Patents 672
6.7.5 Comprehensive In-depth Analysis of the Patent Technical Background of Photoresist 673
6.7.6 Analysis of Core Patents for Photoresist 676
6.7.7 Summary of Photolithographic Resin Patent Status of Japan Synthetic Rubber Company 712
6.8 Dongjin Semichem Co., Ltd. (Korea) 712
6.8.1 Analysis of the Total Number of Photolithography Resin Patent Applications 712
6.8.2 Trend Analysis of Photolithography Resin Patent Applications 713
6.8.3 Analysis of the Legal Status of Photolithography Resin Patents 714
6.8.4 Analysis of the Distribution Areas of Photolithography Resin Patents 716
6.8.5 Comprehensive In-depth Analysis of the Patent Technical Background of Photoresist 718
6.8.6 Analysis of Core Patents for Photoresist 720
6.8.7 Summary of Patent Status for Dongjin Seemikang Photoresist in South Korea 740
6.9 International Business Machines Corporation (IBM), USA 741
6.9.1 Analysis of the Total Number of Photolithography Resin Patent Applications 741
6.9.2 Trend Analysis of Photolithography Resin Patent Applications 741
6.9.3 Analysis of the Legal Status of Photolithography Resin Patents 742
6.9.4 Analysis of the Distribution Areas of Photolithography Resin Patents 745
6.9.5 Comprehensive In-depth Analysis of the Patent Technical Background of Photoresist 747
6.9.6 Analysis of Core Patents for Photoresist 749
6.9.7 Summary of IBM’s Photoresist Patent Situation 758
6.10 South Korea Samsung Electronics (SUMSUNG) 759
6.10.1 Analysis of the Total Number of Photolithography Resin Patent Applications 759
6.10.2 Trend Analysis of Photolithography Resin Patent Applications 759
6.10.3 Analysis of the Legal Status of Photolithography Resin Patents 760
6.10.4 Analysis of the Regional Distribution of Photolithography Patent Applications 762
6.10.5 Comprehensive In-depth Analysis of the Patent Technical Background of Photoresist 764
6.10.6 Analysis of Core Patents for Photoresist 766
6.10.7 Summary of Samsung’s Photoresist Patent Situation 785
Chapter 7: Analysis of the Patent Situation Regarding the Development of Photoresists in China 786
7.1 Analysis of the Total Number of Chinese Photolithography Resin Patent Applications 787
7.2 Trend Analysis of China’s Photoresist Patent Applications 787
7.3 Analysis of the Legal Status of Chinese Photoresist Patents 789
7.4 Analysis of the Distribution of Patent Holders 792
7.5 Overall In-depth Analysis of the Patent Technology Background 794
7.5.1 Technical Field 794
7.5.2 Trend in IPC Classification by Year of Publication 795
7.5.3 Technical Positioning of the Top 30 Patent Holders 796
7.5.4 Patent Owner Citation Relationship 799
7.5.5 Key Technical Indicators 800
7.5.6 Patent Map 960
7.6 Summary of China’s Patent Situation in the Development of Photoresists 961
Chapter 8: Forecast of Technological Development Trends in the Photoresist Industry 963
Chapter 9: The Impact of the Overall Intellectual Property Landscape in Photoresist Development on Industry Structure and Competitive Dynamics 968
Chapter 10: Recommendations for the Overall Patent Layout of China’s Photoresist Industry 973