Recommendation rating: ★★★★★ 718th Research Institute, China Shipbuilding Industry Corporation
Hubei Xingfu Electronic Materials Co., Ltd.
Tetramethylammonium hydroxide (TMAH, 25% concentration)
Hubei Xingfu Electronic Materials Co., Ltd.
Recommendation rating: ★★★★★ Hubei Xingfu Electronic Materials Co., Ltd.
Sulfuric acid (H2SO4, 96% concentration)
Recommendation rating: ★★★★ Hubei Xingfu Electronic Materials Co., Ltd.
Phosphoric acid (H3PO4, 86% concentration)
Recommendation rating: ★★★★★ Hubei Xingfu Electronic Materials Co., Ltd.
Tungsten Chemical Mechanical Polishing Liquid Series
Anji Microelectronics (Shanghai) Co., Ltd.
Cerium Oxide Chemical Mechanical Polishing Slurry Series
Anji Microelectronics (Shanghai) Co., Ltd.
Silica Chemical-Mechanical Polishing Slurry Series
Anji Microelectronics (Shanghai) Co., Ltd.
Silicon Chemical Mechanical Polishing Slurry Series
Recommendation rating: ★★★★ Anji Microelectronics (Shanghai) Co., Ltd.
Copper/Barrier Layer Chemical Mechanical Polishing Slurry Series
Recommendation rating: ★★★★★ Anji Microelectronics (Shanghai) Co., Ltd.
200mm diameter epitaxial wafer (8")
Nanjing Guosheng Electronics Co., Ltd.