Tungsten hexafluoride WF6

Recommendation rating: ★★★★★ 718th Research Institute, China Shipbuilding Industry Corporation

Membrane-removing solution

Hubei Xingfu Electronic Materials Co., Ltd.

Tetramethylammonium hydroxide (TMAH, 25% concentration)

Hubei Xingfu Electronic Materials Co., Ltd.

Aluminum etching solution

Recommendation rating: ★★★★★ Hubei Xingfu Electronic Materials Co., Ltd.

Sulfuric acid (H2SO4, 96% concentration)

Recommendation rating: ★★★★ Hubei Xingfu Electronic Materials Co., Ltd.

Phosphoric acid (H3PO4, 86% concentration)

Recommendation rating: ★★★★★ Hubei Xingfu Electronic Materials Co., Ltd.

Tungsten Chemical Mechanical Polishing Liquid Series

Anji Microelectronics (Shanghai) Co., Ltd.

Cerium Oxide Chemical Mechanical Polishing Slurry Series

Anji Microelectronics (Shanghai) Co., Ltd.

Silica Chemical-Mechanical Polishing Slurry Series

Anji Microelectronics (Shanghai) Co., Ltd.

Silicon Chemical Mechanical Polishing Slurry Series

Recommendation rating: ★★★★ Anji Microelectronics (Shanghai) Co., Ltd.

Copper/Barrier Layer Chemical Mechanical Polishing Slurry Series

Recommendation rating: ★★★★★ Anji Microelectronics (Shanghai) Co., Ltd.

200mm diameter epitaxial wafer (8")

Nanjing Guosheng Electronics Co., Ltd.

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