2015 Silicon Substrate Materials Industry Data Statistics Report

2015 Silicon Substrate Materials Industry Data Statistics Report

2015 Silicon Substrate Materials Industry Data Statistics Report

2015 Silicon Substrate Materials Industry Data Statistics Report

2015 Silicon Substrate Materials Industry Data Statistics Report

This report is based on the requirements of the Chinese market and utilizes the latest data to analyze the domestic silicon-substrate materials industry from various perspectives, including industry size, product production capacity, R&D and industrial development investment, patent status, and workforce characteristics. The report was completed in November 2016. Table of Contents: 1. Overall Industry Size of Silicon-Substrate Materials in China; 2. Production Capacity of Key Products in the Silicon-Substrate Materials Industry; 3. R&D Investment in the Chinese Silicon-Substrate Materials Industry; 4. Industrial Development Investment in the Silicon-Substrate Materials Industry; 5. Patent Status in the Silicon Materials Industry; 6. Workforce Characteristics in the Silicon Materials Industry. Chart Index: Figure 1: Silicon-Substrate Materials, 2005–2016.

Introduction to the Global Photoresist Patent Analysis Report (Part 4)

The top ten patent holders of global photoresist patents, ranked by the number of valid patents held, are shown in the figure below, in the following order: Tokyo Ohka Kogyo of Japan, Shin-Etsu Chemical of Japan, Dow Chemical of the United States, Sumitomo Chemical of Japan, Fujifilm of Japan, Amkor Technology of the United States, Synthetic Rubber of Japan, Dongjin SeimiKang of South Korea, IBM of the United States, and Samsung Electronics of South Korea. Among these, five are Japanese companies, three are U.S. companies, and two are South Korean companies. There are significant differences among these companies in terms of the volume of photoresist patent applications, legal status, countries where patents have been published, and especially their technological strengths. The Materials and Components Alliance has conducted a systematic and in-depth analysis of global photoresist patents, including the global...

Introduction to the Global Photoresist Patent Analysis Report (Part 3)

There are a total of 5,483 patents related to the development of photoresists worldwide, among which 3,726 patents pertain to resins used in photoresists. The specific classification of these resin patents and the proportion of each category are shown in the chart above. Currently, among the resin patents for photoresists, resins used in G-line, I-line, 248nm, 193nm, DUV, and immersion 193nm lithography account for 88% of all such patents. Here, "DUV" refers to resin patents that can be used for both 248nm and 193nm photoresists, while "immersion 193nm" refers specifically to resin patents designed for immersion 193nm photoresists. At present, the photoresists with the largest market value in the industry are also predominantly those based on G-line and I-line technologies.

Introduction to the Global Photoresist Patent Analysis Report (Part 1)

There are a total of 5,483 global patents related to photoresists and associated materials. These patents cover all aspects of the materials required for the preparation and application of photoresists, including resins, monomers, photogenerated acid generators, additives, complementary reagents, auxiliary materials, and their respective manufacturing processes. The proportion of each type of patent is shown in the classification chart mentioned above. As can be seen, resins account for the largest share, making them the area of photoresist technology that has attracted the most attention in the industry; followed by photogenerated acid generators, complementary reagents, and auxiliary materials. Figure 2 illustrates the distribution of global photoresist patents according to their earliest filing year. The earliest patent applications for photoresists date back to 1962, and around 1979, the number of applications began to increase steadily. 2

Introduction to the Global Photoresist Patent Analysis Report (Part 2)

The global patents for photoresist development are primarily concentrated in six major regions: Japan, the United States, South Korea, China, Europe, and Taiwan. The proportion of photoresist patents held by each region is shown in the chart above. As the chart reveals, there are significant differences in the number of photoresist patents held by these six regions: Japan has the largest share, followed by the United States, then South Korea, China, Europe, and Taiwan. Moreover, there are substantial variations among these regions in terms of patent application trends, legal status, publication country status, patent owner profiles, citation patterns, and technical characteristics. The Materials and Components Alliance has conducted a systematic and in-depth analysis of global photoresist patents, covering an overview of global photoresist R&D patents; Europe...

2013 Silicon Substrate Materials Industry Data Statistics Report

This report is based on the requirements of the Chinese market and utilizes the latest data to analyze the domestic silicon substrate material industry from various perspectives, including industry size, production capacity of key products, R&D and industrial development investment, patent status, and workforce characteristics. The report was completed in December 2014. Report Outline: Preface—Introduction to the Silicon Substrate Material Industry; 1. Silicon Single-Crystal Polished Wafers; 2. Silicon Single-Crystal Epitaxial Wafers; 3. Silicon Single-Crystal Annealed Wafers; 4. Zone-Melted Silicon Single-Crystal Wafers; 5. SOI Wafers; 1. Overall Industry Scale of Silicon Substrate Materials in China; 2. Production Capacity of Key Products in the Silicon Substrate Material Industry; 3. China’s Silicon Substrate Material Industry...