Introduction to the Global Photoresist Patent Analysis Report (Part 2)

The global patents for photoresist development are primarily concentrated in six major regions: Japan, the United States, South Korea, China, Europe, and Taiwan. The proportion of photoresist patents held by each region is shown in the chart above. As the chart reveals, there are significant differences in the number of photoresist patents held by these six regions: Japan has the largest share, followed by the United States, then South Korea, China, Europe, and Taiwan. Moreover, there are substantial variations among these regions in terms of patent application trends, legal status, publication country status, patent owner profiles, citation patterns, and technical characteristics. The Materials and Components Alliance has conducted a systematic and in-depth analysis of global photoresist patents, covering an overview of global photoresist R&D patents; Europe...

　　The global patents for photoresist development are primarily concentrated in six major regions: Japan, the United States, South Korea, China, Europe, and Taiwan. The proportion of photoresist patents held by each region is shown in the chart above. As the chart reveals, there are significant differences in the number of photoresist patents held by these six regions: Japan has the highest share, followed by the United States, then South Korea, China, Europe, and Taiwan. Moreover, there are substantial variations among these regions in terms of patent application trends, legal status, publication country status, patent owner affiliations, citation patterns, and technical characteristics.

　　The Materials and Components Alliance conducted a systematic and in-depth analysis of global photolithography patent data, covering topics such as an overview of global photolithography R&D patents; a comparative analysis of photolithography patents across six major regions—Europe, the United States, Japan, South Korea, China, and Taiwan; an analysis of the patent status for different types of photolithographic materials; a detailed examination of the patent profiles of the world’s top ten photolithography companies; and an analysis of China’s photolithography patent landscape. The research report focuses on describing global patent application volumes, patent application trends, patent legal statuses, geographic distribution of patents, distribution of patent holders, citation patterns among patent holders, core patent concepts, patent maps, technical field classification tables, key patents, co-application patterns among patent holders, and the technological positioning of leading patent holders.

　　The “Global Photoresist Industry Patent Analysis Report” comprises 468 pages and 459 charts, and includes full texts of 5,483 photoresist patents as supplementary material.

Key words: