Introduction to the Global Photoresist Patent Analysis Report (Part 4)

The top ten patent holders of global photoresist patents, ranked by the number of valid patents held, are shown in the figure below, in the following order: Tokyo Ohka Kogyo of Japan, Shin-Etsu Chemical of Japan, Dow Chemical of the United States, Sumitomo Chemical of Japan, Fujifilm of Japan, Amkor Technology of the United States, Synthetic Rubber of Japan, Dongjin SeimiKang of South Korea, IBM of the United States, and Samsung Electronics of South Korea. Among these, five are Japanese companies, three are U.S. companies, and two are South Korean companies. There are significant differences among these companies in terms of the volume of photoresist patent applications, legal status, countries where patents have been published, and especially their technological strengths. The Materials and Components Alliance has conducted a systematic and in-depth analysis of global photoresist patents, including the global...

　　The top ten patent holders of global photoresist patents, ranked by the number of valid patents held, are shown in the following figure. They are, in order: Tokyo Ohka Kogyo of Japan, Shin-Etsu Chemical of Japan, Dow Chemical of the United States, Sumitomo Chemical of Japan, Fujifilm of Japan, Amkor Technology of the United States, Synthetic Rubber of Japan, Dongjin SeimiKang of South Korea, IBM of the United States, and Samsung Electronics of South Korea. Among these, five are Japanese companies, three are U.S. companies, and two are South Korean companies. There are significant differences among these companies in terms of the volume of photoresist patent applications, legal status, countries where patents have been published, and especially their technological strengths.

　　The Materials and Components Alliance conducted a systematic and in-depth analysis of global photolithography-related patents, covering topics such as an overview of global photolithography R&D patent activities; a comparative analysis of photolithography patents across six major regions—Europe, the United States, Japan, South Korea, China, and Taiwan; an analysis of the patent landscape for different types of photolithographic materials; a detailed examination of the patent status of the world’s top ten photolithography companies; and an analysis of China’s photolithography patent situation. The research report focuses on describing global patent application volumes, patent application trends, patent legal statuses, geographic distribution of patents, distribution of patent holders, citation patterns among patent holders, core patent concepts, patent maps, technical field classification tables, key patents, joint patent applications among patent holders, and the technological positioning of leading patent holders.

　　The “Global Photoresist Industry Patent Analysis Report” comprises 468 pages and 459 charts, and includes full-text versions of 5,483 photoresist patents.

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