Introduction to the Global Photoresist Patent Analysis Report (Part 3)

There are a total of 5,483 patents related to the development of photoresists worldwide, among which 3,726 patents pertain to resins used in photoresists. The specific classification of these resin patents and the proportion of each category are shown in the chart above. Currently, among the resin patents for photoresists, resins used in G-line, I-line, 248nm, 193nm, DUV, and immersion 193nm lithography account for 88% of all such patents. Here, "DUV" refers to resin patents that can be used for both 248nm and 193nm photoresists, while "immersion 193nm" refers specifically to resin patents designed for immersion 193nm photoresists. At present, the photoresists with the largest market value in the industry are also predominantly those based on G-line and I-line technologies.

　　There are a total of 5,483 patents worldwide related to the development of photoresists, among which 3,726 patents pertain to resins used in photoresists. The specific classification of these resin patents and the proportion of each category are shown in the chart above. Currently, among the resin patents for photoresists, resins used in G-line, I-line, 248nm, 193nm, DUV, and immersion 193nm lithography account for 88% of all resin patents. Here, "DUV" refers to resin patents that can be applied to both 248nm and 193nm photoresists, while "immersion 193nm" refers specifically to resin patents designed for immersion 193nm photoresists. At present, the photoresists with the largest market value in the industry are also primarily G-line/I-line, 248nm, and 193nm photoresists.

　　The Materials and Components Alliance conducted a systematic and in-depth analysis of global photoresist patents, covering topics such as an overview of global photoresist R&D patent activities; a comparative analysis of photoresist patents across six major regions—Europe, the United States, Japan, South Korea, China, and Taiwan; an analysis of the patent status for different types of photoresists; a detailed examination of the patent profiles of the world’s top ten photoresist companies; and an analysis of China’s photoresist patent landscape. The research report focuses on describing global patent application volumes, patent application trends, patent legal statuses, geographic distribution of patents, distribution of patent holders, citation patterns among patent holders, core patent concepts, patent maps, technology field classification tables, key patents, joint patent application activities among patent holders, and the technological positioning of leading patent holders.

　　The “Global Photoresist Industry Patent Analysis Report” comprises 468 pages and 459 charts, and includes full-text versions of 5,483 photoresist patents as supplementary material.

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