Zhou Ming

General Manager of Saimaike Advanced Materials Co., Ltd.

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Invited Guests

Reporting Speaker

Product accessories:

Product Description

Personal Profile:

Mr. Zhou Ming currently serves as the General Manager of Saimaike Advanced Materials Co., Ltd. and as the Chairman of the Sub-Association for Nuclear Graphite and Carbon Materials Testing and Application under the Chinese Nuclear Society. He has long been engaged in the management, operation, and technical planning of specialized graphite and advanced carbon materials enterprises, leading efforts to achieve domestic production in several niche segments of the carbon materials industry. He actively promotes collaborative innovation across the semiconductor industry chain, focusing on advancing the research and development of specialized graphite and advanced carbon materials for semiconductor applications, and striving to realize deep integration and coordinated development within the entire semiconductor value chain.

Report Title:

Fine-grained graphite – the cornerstone of semiconductor material manufacturing

Speech Abstract:

This report will elaborate on the property characteristics of graphite materials, the applications of high-purity graphite materials in semiconductor manufacturing, and the solutions offered by the PYROCⓇ series of fine-grained graphite in the semiconductor sector, with the aim of better guiding and optimizing the design and use of graphite and carbon-based products in the integrated circuit industry.

The report will identify key control points for the design of fine graphite products from the perspectives of product design concepts and the selection of basic product functions. The report also provides an extended overview of current industrial practices in the industry.

The report will focus on the material characteristics of isostatically pressed graphite and analyze its micro-, meso-, and atomic-scale structures. It will also explain the “crazy pave” structure found in graphite materials and, from the perspective of the dynamics of intermittent carbon atoms and carbon atom vacancies, provide an analysis of the material’s failure mechanisms. Furthermore, the report will offer recommendations on how to enhance its performance in semiconductor manufacturing processes, such as the application of graphene and fullerenes in carbon-based materials for semiconductors.

The report also puts forward proposed solutions for improving the use of graphite and carbon materials in semiconductor manufacturing, and offers insights and recommendations for the collaborative development of the future industrial chain.

Materials Alliance

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