Plasma-focused ion beam

Category:

Joint Analysis, Testing, and Technology Cooperation Service Platform

Testing instrument

Silicon Material Testing Instrument

Encapsulation Material Testing Instrument

Product accessories:

Product Description

Instrument and Equipment Information
Instrument Name	Plasma-focused ion beam	Instrument model	Dual-beam FIB Helios G4 CX
Instrument Name	Focused Ion Beam	Place of origin and manufacturer	United States / Thermo Fisher
Affiliated Unit	The Fifth Research Institute of the Ministry of Industry and Information Technology (China SaiBao Laboratory)	Acquisition time	2018
Placement location	No. 78, West Zhu Village Avenue, Zhu Village Subdistrict, Zengcheng District, Guangzhou City, Guangdong Province	Instrument Status	Normal
Device application range / Instrument measurement range (tolerance)	Application scope: 1. Perform pinpoint cutting on materials to prepare cross-sections for observing internal structures, and use energy-dispersive spectroscopy and electron backscatter diffraction cameras to analyze the composition and structure at specific locations; 2. Conduct pinpoint circuit repairs on chips; 3. Prepare high-quality ultrathin TEM samples. Main parameters: FIB resolution: 2.5 nm at 30 kV; SEM resolution: 0.6 nm at 15 kV; Energy-dispersive spectroscopy resolution: 125 eV.
Whether it is regularly calibrated by a third-party agency	No	CNAS certification obtained.	Yes

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