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Lithography machine

Category:

Joint Analysis, Testing, and Technology Cooperation Service Platform

Process equipment

Photolithography Material Process Equipment

Product accessories:


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Product Description

Instrument and Equipment Information

Instrument Name

Lithography machine

Instrument model

Step 5500/800

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Place of Origin and Manufacturer

Netherlands/ ASML

Affiliated Unit

Beijing Kehua Microelectronics Materials Co., Ltd.

Acquisition time

2012

Placement location

No. 4, Zhuyuan Road, Shunyi District, Beijing Municipality

Instrument Status

Normal

Device application range / Instrument measurement range (tolerance)

Photoresist exposure:

Exposure wavelength: 248 nm; Wafer size: 8 inches; Resolution: 110 nm.

Whether it is regularly calibrated by a third-party agency

No

CNAS certification obtained.

No