Lithography machine
Category:
Joint Analysis, Testing, and Technology Cooperation Service Platform
Process equipment
Photolithography Material Process Equipment
Product accessories:
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Product Description
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Instrument and Equipment Information |
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Instrument Name |
Lithography machine |
Instrument model |
Step 5500/800 |
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Scanner |
Place of Origin and Manufacturer |
Netherlands/ ASML |
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Affiliated Unit |
Beijing Kehua Microelectronics Materials Co., Ltd. |
Acquisition time |
2012 |
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Placement location |
No. 4, Zhuyuan Road, Shunyi District, Beijing Municipality |
Instrument Status |
Normal |
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Device application range / Instrument measurement range (tolerance) |
Photoresist exposure: Exposure wavelength: 248 nm; Wafer size: 8 inches; Resolution: 110 nm. |
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Whether it is regularly calibrated by a third-party agency |
No |
CNAS certification obtained. |
No |
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