Nikon KrF Scanner Lithography Machine

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Joint Analysis, Testing, and Technology Cooperation Service Platform

Process equipment

Photolithography Material Process Equipment

Product accessories:

Product Description

Instrument and Equipment Information
Instrument Name	Chinese: Nikon KrF scanning lithography machine	Instrument model	NIKON S204B
Instrument Name	NIKON KrF Exposure Scanner	Place of origin and manufacturer	Japan/NIKON
Affiliated Unit	Jiangsu Hantuo Optical Materials Co., Ltd.	Acquisition time	2016
Placement location	Xuzhou Science and Technology Development Zone, Jiangsu Province	Instrument Status	Normal
Device application range / Instrument measurement range (tolerance)	KrF laser (248 nm wavelength) photoresist exposure equipment, 8-inch format, with a resolution of 180 nm half-pitch. Suitable for lithography processes at the 180 nm technology node. Several spin-coating and developing units—TEL ACT8, with 8 cassettes—can be used in conjunction with the NIKON S204B. The system is equipped with HMDS, PAB, PEB, coating, and developing modules; all components are functioning normally and are suitable for pilot production runs. ICP-MS, manufactured by HP, is used to determine trace metal concentrations in organic liquids, with a detection limit as low as 10 ppt. The liquid particle counter, NEON, can detect the number of particles and their size distribution in liquids.
Whether it is regularly calibrated by a third-party agency	Yes	CNAS certification obtained.	Yes

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