Contact Us       中文

Search

1

1

 
>
C-MRS 2015

C-MRS 2015

Page view:

 

The China Materials Conference is the most important series of meetings of the China Society for Materials Research and is held once a year. The purpose of the conference is to build a communication platform for experts, scholars, professors, scientific and technological workers, government-related management departments, leaders, entrepreneurs and other relevant personnel engaged in the research, development and industrialization of new materials in China, and to exchange and share materials research. The latest achievements have achieved the goal of promoting mutual improvement and improving the status and role of new materials in China’s national economic and social development. “China Materials Conference 2015” was held in Guiyang, Guizhou Province on July 10-14, 2015. The conference was initiated by the China Society for Materials Research and co-sponsored by the China Society for Materials Research and the Guiyang Convention and Exhibition Economic Promotion Office. The conference has 30 sub-meetings, including 4 international chapters and 26 domestic chapters. The essay covers energy and environmental materials, new functional materials, ceramics and polymer materials, high-performance structural materials, material design, preparation and evaluation. field. In addition, materials education forums, materials science and technology periodicals forums, new materials companies and expert matchmaking meetings, and new materials laboratory equipment exhibitions were held.

Atlas

member

Director, Shanghai Institute of Microsystems and Information Technology, Chinese Academy of Sciences
Shanghai Institute of Microsystem and Information Technology, CAS, China
浙江大学硅材料国家重点实验室主任
Secretary General of the Integrated Circuit Materials Industry Technology Innovative Alliance
华南师范大学彩色动态电子纸显示技术研究所所长
哈尔滨工业大学化工学院教授、博导、系主任
中国科学院半导体研究所研究员、博士生导师
北京大学教授、博士生导师
中国科学院化学研究所副所长
清华大学教授
中国科学院上海微系统与信息技术研究所研究员
中国科学院微电子研究所先导工艺研发中心工程师
报告题目:电子束光刻胶中的聚合物材料  报告简介:在微电子工艺和纳米加工中,电子束光刻胶是比较常用的高分辨率的图形掩模材料。电子束光刻胶的重要材料是有机聚合物。文中论述了各种用于电子束光刻胶的聚合物材料,从聚合物的单体结构,聚合物的不同组成,分子量范围及其分布,以及在电子束光刻胶中的表征,说明了他们对于电子束光刻胶性能的影响。光刻工艺的变化对于聚合物材料在光刻时的表现也起着重要的作用。作者最后列举
中国科学院微电子研究所工程师
东北大学 材料各向异性与织构教育部重点实验室

Report

Preparation and properties of supersaturated sulfur doped silicon materials
Field Emission Properties of ZnO/Si-NPA
Determination of the isothermal section of the Ag-Cu-Sn ternary system rich in Ag-Cu region at 450 °C
Organic/inorganic alternating structure film process and control for organic device packaging
Acquisition of high quality silicon-based gallium arsenide materials
Study on Structure, Magnetic Properties and Transport Properties of Hexagonal MnNiGa Films

Notice

No content information display available
Please add data record on website background.

Contact Us

Contact:Sannian Song
Mailbox:songsannian@mail.sim.ac.cn 
Phone:13818144065