Focused Ion Beam Field Emission Scanning Electron Microscope
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Joint Analysis, Testing, and Technology Cooperation Service Platform
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Product Description
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Instrument and Equipment Information |
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Instrument Name |
Focused Ion Beam Field Emission Scanning Electron Microscope |
Instrument model |
Auriga Compact |
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DualBeam-FIB |
Place of origin and manufacturer |
Germany/Zeiss |
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Affiliated Unit |
HuaXin Testing (Wuxi) Co., Ltd. |
Acquisition time |
2014 |
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Placement location |
Building D1, 3rd Floor, No. 200 Linghu Avenue, Xinwu District, Wuxi City, Jiangsu Province |
Instrument Status |
Normal |
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Device application range / Instrument measurement range (tolerance) |
The FIB can accelerate and focus an ion beam generated by the ion source through an ion gun, then direct it onto the sample surface to produce secondary electron signals for acquiring electron images. Alternatively, a high-current ion beam can be used to sputter surface atoms, enabling micro- and nanoscale surface topography fabrication. Typically, this process combines physical sputtering with chemical gas reactions, allowing for selective removal of metals, silicon oxide layers, or deposition of metal films. |
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Whether it is regularly calibrated by a third-party agency |
Yes |
CNAS certification obtained. |
No |
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