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Jiangsu Dena Chemical Co., Ltd.

Jiangsu Dynamic Chemical Co., Ltd.

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Product Description

Product Category Secondary Category Product Name Image introduction Manufacturer Product Features
Process chemicals Functional chemicals Propylene glycol monomethyl ether (PM)

 

 

Jiangsu Dena Chemical Co., Ltd. Suitable for cleaning semiconductor equipment and preparing EBR solvents.
Each metal ion is less than 5 ppb.
Content greater than 99.9%
Controllable particle size
Colorless, transparent solvent
Hazardous chemicals
Process chemicals Functional chemicals Propylene glycol methyl ether acetate

 

 

Jiangsu Dena Chemical Co., Ltd. Suitable for cleaning semiconductor equipment and preparing EBR solutions.
Agent, photoresist solvent, photoresist thinning agent.
Each metal ion is less than 5 ppb.
Content greater than 99.9%
Controllable particle size
Colorless, transparent solvent
Hazardous chemicals
Process chemicals Functional chemicals Diluent DN73

 

 

Jiangsu Dena Chemical Co., Ltd. It can be used for pre-coating wetting and post-coating edge cleaning, making it an essential and indispensable chemical in the photolithography process. It is formulated from a mixture of propylene glycol methyl ether and its acetate ester.
Each metal ion is less than 1 ppb.
Controllable particle size
Colorless, transparent solvent
Hazardous chemicals
Process chemicals Functional chemicals Diethylene glycol methyl ether   Jiangsu Tianyin Chemical Co., Ltd. Photoresist stripping solution—key component; LED glass substrate cleaner
Metal ions less than 5 ppb
Colorless, transparent solvent
Process chemicals Functional chemicals Diethylene glycol ethyl ether

 

 

Jiangsu Dena Chemical Co., Ltd. Photoresist stripping solution—key component; LED glass substrate cleaner
Metal ions less than 5 ppb
Colorless, transparent solvent
Process chemicals Functional chemicals Diethylene glycol butyl ether

 

 

Jiangsu Dena Chemical Co., Ltd. Key components of photoresist stripping solution
Metal ions less than 5 ppb
Colorless, transparent solvent
Process chemicals Functional chemicals Diethylene glycol dimethyl ether   Jiangsu Tianyin Chemical Co., Ltd. Photoresist solvent component used to adjust the volatilization gradient of the photoresist.
Metal ions less than 5 ppb
Excellent acid and alkali resistance
Colorless, transparent solvent
Process chemicals Functional chemicals Diethylene glycol monoethyl ether

 

 

Dena Coastal Chemical Co., Ltd. Photoresist solvent component used to adjust the volatilization gradient of the photoresist.
Metal ions less than 5 ppb
Excellent acid and alkali resistance
Colorless, transparent solvent