Invited speaker Deng Hai
Fellow at the lithography company TOK
Category:
2014
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Deng Hai has been serving as a fellow at the lithography company TOK since February 2014. Prior to that, he worked at Intel’s Advanced Lithography Materials Division as a Senior Principal Engineer and Program Manager, responsible for the research, development, and application of photoresist polymer materials. During his time at Intel, he collaborated on research projects with the renowned laboratory of Professor Grant Willson at the University of Texas, the laboratory of Professor Ober at Cornell University, the laboratory of Professor Tagawa at Osaka University, and the National Institute of Standards and Technology (NIST) in the United States. In collaboration with Professor Ober, he published a paper on using molecular glass for lithography of lines below 50 nanometers, which was selected as an Editor’s Choice by Science magazine. Since then, molecular glass has become a hot topic in the EUV field, significantly influencing the R&D process of EUV photoresists.
Report Title: Patterning Technology Trends and New Material Challenges
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