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Introduction to Global Photoresist Patent Analysis Report (1)

Introduction to Global Photoresist Patent Analysis Report (1)

Source:
2016/08/01
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A total of 5,583 patents on photoresists and related materials worldwide cover patents covering various aspects of photoresist preparation and application, including photoresist resins, monomers, photoacid generators, additives, and supporting reagents. Auxiliary materials and their production processes, the proportion of various patents can be found in the above classification chart. It can be seen that the proportion of resin is the largest, which is the most concerned aspect of photoresist technology in the industry, followed by photoacid generators, supporting reagents and auxiliary materials. Figure 2 shows the distribution of global photoresist patents in the earliest application year. The earliest patent application for photoresists began in 1962 and began to grow steadily around 1979. It reached its peak in 2011-2012 and is still in its peak. .

 

The Materials and Components Alliance conducted a systematic and in-depth analysis of global photoresist patents, including a global patent for photoresist development; comparison of photoresist patents in six regions of Europe, the United States, Japan, Korea, China, and Taiwan; Photographic analysis of photoresists; deep analysis of patent status of the world's top ten photoresist companies; analysis of patent status of Chinese photoresists. The research report focuses on the global patent application volume, patent application trend, patent law status, patent distribution area, patent holder distribution, patentee citation status, patent core concept, patent map, technical field classification table, core patent, patent right. People apply for patents, and the technical position of top patent holders.

 

The "Global Photoresist Industry Patent Analysis Report" has a total of 468 pages, 459 charts, and can be attached to the full text of 5,48 photoresist patents. Enterprises and institutions engaged in research and development, production and investment of photoresists provide valuable reference information in strategy formulation, technology positioning and product development. If necessary, please contact Wang Yanmei 010-82357517/18701286298