The global photoresist development patents are mainly distributed in six regions of Japan, the United States, South Korea, China, Europe and Taiwan, and the proportion of photoresist patents in each region is shown in the above figure. It can be seen from the figure that the patent share of photoresist in the six regions is very different, the most is Japan, followed by the United States, then South Korea, China, Europe and Taiwan. The differences in photoresist patent application trends, legal status, state of the open country, patentees and citations, and technical characteristics of various regions are also large.
The Materials and Components Alliance conducted a systematic and in-depth analysis of global photoresist patents, including a global patent for photoresist development; comparison of photoresist patents in six regions of Europe, the United States, Japan, Korea, China, and Taiwan; Photographic analysis of photoresists; deep analysis of patent status of the world's top ten photoresist companies; analysis of patent status of Chinese photoresists. The research report focuses on the global patent application volume, patent application trend, patent law status, patent distribution area, patent holder distribution, patentee citation status, patent core concept, patent map, technical field classification table, core patent, patent right. People apply for patents, and the technical position of top patent holders.
The "Global Photoresist Industry Patent Analysis Report" has a total of 468 pages, 459 charts, and can be attached to the full text of 5,48 photoresist patents. Enterprises and institutions engaged in research and development, production and investment of photoresists provide valuable reference information in strategy formulation, technology positioning and product development. If necessary, please contact Wang Yanmei 010-82357517/ 18701286298