Plasma-focused ion beam
Category:
Joint Analysis, Testing, and Technology Cooperation Service Platform
Testing instrument
Silicon Material Testing Instrument
Product accessories:
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Product Description
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Instrument and Equipment Information |
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Instrument Name |
Plasma-focused ion beam |
Instrument model |
FEI-235/FEI-835/FEI-200/FEI-800 |
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Focused Ion Beam |
Place of Origin and Manufacturer |
United States / Thermo Fisher |
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Affiliated Unit |
Nari Technology (Beijing) Co., Ltd. |
Acquisition time |
2011 |
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Placement location |
Room 107, Building A, Yingchuang Dynamics, No. 1 Shangdi East Road, Haidian District, Beijing Municipality |
Instrument Status |
Normal |
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Device application range / Instrument measurement range (tolerance) |
Application scope: 1. Perform pinpoint cutting on materials to prepare cross-sections for observing internal structures, and use energy-dispersive spectroscopy and electron backscatter diffraction cameras to analyze the composition and structure at specific locations; 2. Conduct pinpoint circuit repairs on chips; 3. Prepare high-quality, ultra-thin TEM samples. Main parameters: FIB resolution: 2.5 nm at 30 kV; SEM resolution: 0.6 nm at 15 kV; Energy-dispersive spectroscopy resolution: 125 eV. |
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Whether it is regularly calibrated by a third-party agency |
No |
CNAS certification obtained. |
No |
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