Inductively Coupled Plasma Emission Spectrometer
Category:
Joint Analysis, Testing, and Technology Cooperation Service Platform
Testing instrument
Silicon Material Testing Instrument
Photolithography Material Testing Instrument
Process Chemical Testing Instruments
Polishing Material Testing Instrument
Sputtering Target Testing Instrument
Encapsulation Material Testing Instrument
Product accessories:
Contact Us
Product Description
|
Instrument and Equipment Information |
|||
|
Instrument Name |
Inductively Coupled Plasma Emission Spectrometer |
Instrument model |
5100 |
|
ICP-OES |
Place of origin and manufacturer |
United States / Aglient |
|
|
Affiliated Unit |
The Fifth Research Institute of Electronics, Ministry of Industry and Information Technology (China SaiBao Laboratory) |
Acquisition time |
2018 |
|
Placement location |
No. 78, West Zhu Village Avenue, Zhu Village Subdistrict, Zengcheng District, Guangzhou City, Guangdong Province |
Instrument Status |
Normal |
|
Device application range / Instrument measurement range (tolerance) |
Application scope: Suitable for the quantitative analysis of trace heavy metals in various samples of integrated circuit materials, as well as for rapid qualitative and quantitative analysis. Also suitable for the quantitative analysis of conventional content of major components in metals and inorganic non-metallic minerals, and for rapid qualitative and quantitative analysis. Main parameters: Instrument detection limits (ug/L): Ba 455.403 nm, 0.05; Cd 214.439 nm, 0.1; Cu 324.754 nm, 0.5; Fe 238.204 nm, 0.2; Mg 279.553 nm, 0.02; Pb 220.353 nm, 2.0. |
||
|
Whether it is regularly calibrated by a third-party agency |
Yes |
CNAS certification obtained. |
Yes |
Previous page
Next page
Previous page
Next page