Suzhou Ruihong Electronic Chemicals Co., Ltd.
Suzhou Ruihong Electronic Chemical Co., Ltd.
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Product Description
| Product Category | Secondary Category | Product Name | Image introduction | Manufacturer | Product Features |
| Photoresist and Polyimide | UV Broadband Positive Photoresist |
RZJ-390/304/306/306B/307/ 325/3600/2500 |
|
Suzhou Ruihong Electronic Chemicals Co., Ltd. | The RZJ series UV broad-spectrum positive photoresist is a phenolic resin-based positive photoresist that is compatible with both G-line and I-line wavelengths. This product series finds applications across a wide range of industries, including TFT-array, LCD, and TP manufacturing. It is also suitable for LED patterned substrates and chip fabrication, as well as semiconductor manufacturing. Featuring high photosensitivity and excellent adhesion, this photoresist is particularly well-suited for wet etching processes. |
| Photoresist and Polyimide | UV broad-spectrum negative photoresist | RFJ-210/220/230/210G |
|
Suzhou Ruihong Electronic Chemicals Co., Ltd. | The RFJ series negative photoresist is a cycloalkene-rubber-based, diazo-type negative photoresist that boasts advantages such as high adhesion, high resolution, excellent etch resistance, and superior thermal stability. It is primarily used in the manufacturing of semiconductor discrete devices and integrated circuits. |
| Photoresist and Polyimide | UV I-line photoresist | RZJ-5513/5312 |
|
Suzhou Ruihong Electronic Chemicals Co., Ltd. | The RZJ series UV I-line positive photoresist is a high-sensitivity, I-line positive photoresist suitable for both line and via applications. It meets the high-sensitivity and high-resolution requirements of manufacturing processes such as ULSI and VLSI, with an ultimate resolution reaching 0.35 μm. |
| Photoresist and Polyimide | UV-wide-alkali-soluble chemically amplified negative photoresist | RPN-1150 |
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Suzhou Ruihong Electronic Chemicals Co., Ltd. | RPN-1150 is an alkali-soluble, chemically amplified negative photoresist suitable for the lift-off process. It features variable angle control, a wide PEB window, easy stripping performance, and high thermal stability. |
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