Chen Xin
Chairman and General Manager of Beijing Kehua Microelectronics Materials Co., Ltd.
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Executive Director
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Professor, Chairman and General Manager of Beijing Kehua Microelectronics Materials Co., Ltd. 1982 Graduated from Beijing University of Chemical Technology and subsequently engaged in scientific research at the Lanzhou Research Institute of the Ministry of Chemical Industry and at the Research Institute of Beijing Yanshan Petrochemical Company. 1985 Studied abroad in the U.S. this year; 1990 Graduated from the University of Massachusetts in the U.S. with a major in Polymer Chemistry, and his graduation thesis received that year’s... ANTEC The Best Student Paper Award; 1992 Year of entry into the United States Shipley The company has begun entering the photoresist field and is engaged in... 248 nm Research and development work on photoresist. 1993 The year, together with two other shareholders, co-founded the U.S. MCC The company continues its research on photoresists and has, as the lead person for specific projects, several times successfully applied for funding from the United States. NSF , United Kingdom DRA Funded research project, and obtained in the United States 2002/2003 Annual Award for Professionals Who Have Made Outstanding Contributions. 2003 Founded the United States in the year MENG TECHNOLOGY Company, 2004 In the same year, Beijing Kehua Microelectronics Materials Co., Ltd. was established in China, specializing in the R&D and production of high-end photoresists. 2010 Completed this year 248nm Pilot production line for photoresist, established to meet the requirements of high-end applications. 248nm Deep-ultraviolet photoresist R&D and testing platform. 2014 Year 248nm Photoresist has officially entered the Chinese market and has secured orders from domestic integrated circuit manufacturing companies.
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