The technical seminar on “Defect Control & Advanced Filtration Technologies in the Semiconductor Industry” was successfully held in Beijing.

　　On June 14, 2018, the thematic technical lecture—“Defect Control & Advanced Filtration Technologies in the Semiconductor Industry” (Phase II)—organized by the Integrated Circuit Materials and Components Industry Technology Innovation Strategic Alliance (hereinafter referred to as the “Alliance”), was successfully held in Beijing. This lecture specially invited Dr. David Huang, a specially appointed expert on the Alliance’s Expert Advisory Committee and Vice President of the U.S.-based company Pall, to serve as the lecturer. More than twenty participants from companies and research institutes—including Guangdong Leading Rare Materials Co., Ltd., Dalian Free Trade Zone KeliDe Chemical Technology Development Co., Ltd., Guangdong Huater Gas Co., Ltd., Guizhou Weidun Jinglin Electronic Materials Co., Ltd., Luling Electronic Materials (Tianjin) Co., Ltd., Tianjin Huahai Qingke Mechanical and Electrical Technology Co., Ltd., Tsinghua University, and Hubei Dinglong Holding Co., Ltd.—attended the lecture.

Beijing Multi-Dimensional Electronic Materials Technology Development and Promotion Center

Speech by Shi Ying, Secretary-General of the Materials and Components Alliance, before the meeting.

Beijing Multi-Dimensional Electronic Materials Technology Development and Promotion Center

Lecturer Dr. Huang interacted enthusiastically with the students.

　　In semiconductor chip manufacturing and flat-panel display fabrication processes, reducing and controlling “defects and contamination” is a challenging technical issue that everyone must confront. The causes of defects and contamination are complex; they not only significantly impact the R&D progress and yield rate of chip manufacturing processes but also pose a major technical challenge for manufacturers that supply high-quality materials and equipment to the semiconductor industry. Dr. Huang addressed these industry challenges in depth, drawing on his extensive industry experience, and provided clear and insightful explanations and analyses on topics including semiconductor market trends, manufacturing roadmaps, defect control and yield improvement, cleanliness requirements for lithography and etching processes in terms of defects and contamination, gas filtration and purification requirements, properties of filter membrane materials, compatibility between media and chemical substances, as well as filter selection and application. At the end of the lecture, Dr. Huang shared his own experiences and insights, addressing the questions and difficulties encountered by participants in their daily work. The atmosphere at the event was warm and friendly, with lively interaction between the lecturer and the participants.

　　After the class, the participants expressed that they had greatly benefited from it. This technical lecture not only effectively promoted and popularized knowledge about defect control and enhanced their awareness of the importance and urgency of filtration technology in the semiconductor industry, but also played a positive role in broadening their industry-specific knowledge.

Beijing Multi-Dimensional Electronic Materials Technology Development and Promotion Center

A group photo at the tech lecture.

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