Best Contribution Award

Winning Unit

Fu Zhuhong, General Manager of Guangdong Huate Gas Co., Ltd.

Award Introduction

Fu Zhuhong, General Manager of Guangdong Huate Gas Co., Ltd., Senior Engineer, and Vice Chairman of the Gases Sub-Technical Committee of the National Technical Committee for Standardization of Semiconductor Equipment and Materials. He leads the company’s R&D efforts in electronic gases. 20 Electronic gases of multiple varieties are being used in domestic 8-inch and 12-inch chip manufacturing plants, with some products already adopted in the 5-nanometer process technology node. The lithography gases developed by our team have been certified by ASML and are widely used by leading IC manufacturers. We have spearheaded numerous national and provincial projects, including the “02 Special Project,” making significant contributions to the technological advancement and large-scale application of electronic gas products.

Winning Unit

Ren Kai, Deputy General Manager of Nanjing Guosheng Electronics Co., Ltd.

Award Introduction

Ren Kai, Deputy General Manager of Nanjing Guosheng Electronics Co., Ltd., boasts extensive experience in silicon epitaxy technology and production management. He established and led Guosheng’s “Team for Promoting the Localization of Key Raw Materials, Auxiliary Materials, and Critical Consumables and Spare Parts for Semiconductor Silicon Epitaxy,” collaborating closely with leading enterprises across China’s related industrial chain. As a result, significant achievements have been made in localizing epitaxy equipment, critical components, and specialized gas systems. This not only ensures the security of the semiconductor silicon epitaxy supply chain but also drives the overall technological advancement and industrial transformation of domestic supporting enterprises, creating a win-win and multi-win situation of healthy development.

Winning Unit

SMIC, Shi Wei

Award Introduction

In the collaboration between Beijing Kehua and the Lithography Department of SMIC’s Beijing Fab, Manager Shi Wei has not only provided Beijing Kehua with numerous targeted recommendations on product planning, photoresist testing, and equipment stability, but has also advocated for deeper communication and cooperation between the two sides. Through regular technical exchanges, he has helped lithography engineers gain a better understanding of the mechanisms underlying photoresists, thereby continuously enhancing their confidence in locally produced photoresist products. Over the past five years, several KrF products have been successfully developed. Contribute to fostering local photoresist supply capabilities by standardizing and scaling up the production and application of i-line photoresists.

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