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2020
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The review meeting for the group standards of the Integrated Circuit Materials Industry Technology Innovation Alliance was held in Ningbo.
On December 16, 2020, the Standards Committee of the Integrated Circuit Materials Industry Technology Innovation Alliance (hereinafter referred to as “ICMtia”) held a review meeting for group standards in Ningbo.
On December 16, 2020, the Standards Committee of the Integrated Circuit Materials Industry Technology Innovation Alliance (hereinafter referred to as “ICMtia”) held a review meeting for group standards in Ningbo.
The meeting was chaired by Liu Bing, Director of the ICMtia Standards Committee. Experts from the review panel, as well as leaders and engineering technicians from several relevant organizations, attended the meeting. The meeting reviewed five draft group standards submitted for review: "ArF Dry Photoresist for Integrated Circuits," "ArF Immersion Photoresist for Integrated Circuits," and "Photolithographic Testing Methods for ArF Photoresists for Integrated Circuits," all drafted by Ningbo Nanda Optoelectronic Materials Co., Ltd. and under the jurisdiction of ICMtia; and "ArF Photoresist Monomers—Part 1: Liquid Methyl Acrylate-Based Compounds" and "ArF Photoresist Monomers—Part 1: Solid Methyl Acrylate-Based Compounds," both drafted by Xuzhou Bokang Information Chemicals Co., Ltd.

After listening to the report from the standards drafting group, the review panel’s experts examined the relevant materials and conducted a rigorous and meticulous review and discussion of each item and article in the draft standard for submission, offering numerous feasible suggestions for revision.

The entire review process strictly adhered to the “Standard Development Procedures” stipulated by the ICMtia Standards Committee. Ultimately, the final review panel voted to approve the draft versions of “ArF Dry Photoresist for Integrated Circuits,” “ArF Immersion Photoresist for Integrated Circuits,” “Photolithographic Testing Methods for ArF Photoresists for Integrated Circuits,” and “ArF Photoresist Monomers—Part 1: Liquid Methyl Acrylate-Based Compounds” and “ArF Photoresist Monomers—Part 1: Solid Methyl Acrylate-Based Compounds.” The panel also recommended that the drafting group revise the drafts according to the review panel’s comments and then prepare the finalized standard submission for approval.

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