Nanjing University Optoelectronics Invests in Beijing Kehua, Accelerating the Industrialization of High-End Photoresists in China; Cooperation Among Members of the Integrated Circuit Materials Alliance Finally Yields Practical Results.

On November 24, 2015, the Symposium on Photoresist Technology and Industry Development, together with the investment signing ceremony for Jiangsu Nanda Optoelectronic Materials Co., Ltd. (hereinafter referred to as “Nanda Optoelectronics”) in Beijing Kehua Microelectronics Materials Co., Ltd. (hereinafter referred to as “Beijing Kehua”), was held at the Beijing Convention Center. Attending the event were Director Qiu Gang from the Office of Major Special Projects of the Ministry of Science and Technology, Director Ye Tianchun, Chief Technical Advisor of National Project 02, Executive Vice Chairman Xu Xiaotian of the China Semiconductor Industry Association, as well as nearly a hundred representatives from government agencies, industry, academia, research institutions, and end-users, including consultants for National Project 02, experts from the National Project 02 General Group, representatives from the National Big Fund, national experts in new materials, and delegates from Beijing Kehua, Nanda Optoelectronics, SMIC, and Wuhan Xinxin. The conference was jointly organized by Beijing Kehua Microelectronics Materials Co., Ltd., Jiangsu Nanda Optoelectronic Materials Co., Ltd., and the Integrated Circuit Materials Industry Technology Innovation Strategic Alliance.

　　Photoresist is an essential foundational material for the electronic information industry, playing a crucial supporting role in sectors such as integrated circuits, discrete devices, flat-panel displays, and LEDs. To reverse China's long-term reliance on imports for high-end photoresists, the "02 Special Project" launched the "R&D and Industrialization of 248nm Photoresist" project in 2010. Beijing Kehua, by undertaking this project, has completed the development of basic 248nm photoresist products and built industrial-scale production capabilities. Additionally, it has established an experimental platform for developing photoresist application processes. The developed products have already passed the evaluation by SMIC and have begun small-scale supply. Building on these achievements, Nanda Optoelectronics has invested 123 million yuan to address the funding shortages faced by Beijing Kehua in the systematic development of 248nm photoresist products and the localization of key raw materials, which will significantly accelerate the commercialization of 248nm photoresist.

　　In his speech, Director Qiu Gang pointed out that materials are the foundation of the integrated circuit industry, and photoresists are a key component of these materials. Photoresists are also one of the key research areas included in the 13th Five-Year Plan for major national projects. He expressed the hope that all relevant parties—industry, academia, research institutions, end-users, and capital providers—will work closely together to thoroughly explore and develop practical implementation plans for integrating resources, leveraging complementary strengths, and fostering the sustainable growth of China’s photoresist industry, while accelerating the advancement of related efforts.

　　During the seminar, Shi Ying, Secretary-General of the Materials Alliance, delivered a keynote report titled “The Current Status and Development Prospects of China’s Semiconductor Manufacturing Materials Industry.” While reviewing the development journey of China’s semiconductor manufacturing materials industry, its significant achievements, and future development goals, the report focused on analyzing the competitive landscape of photoresists both domestically and internationally, as well as the prominent challenges currently facing China’s photoresist industry. The report highlighted the opportunity presented by Nanda Optoelectronics’ investment in Beijing Kehua, emphasizing that this partnership could help seize major opportunities such as the start of the 13th Five-Year Plan and the “Made in China 2025” initiative. By pooling talents from various sectors, mobilizing diverse funding sources, and adopting an open and cooperative approach, the industry can overcome current difficulties and achieve sustainable development. Chen Xin, Chairman of Beijing Kehua, reported to the conference on the company’s progress in the development and market promotion of i-line and 248nm photoresist technologies, as well as the future roadmap for advanced photoresist technology development. Xu Congying, Technical Director of Nanda Optoelectronics, presented to the assembly a preliminary implementation plan for 193nm photoresists. Sun Xiangzhen, Chairman of Nanda Optoelectronics, and Dr. Feng Changzheng, representative of Beijing Kehua’s investors, shared their insights on developing the high-end electronic materials industry and expressed their commitment to further increasing investment in the photoresist sector. They emphasized that, while contributing to the achievement of national strategic goals, they would also ensure the company’s continued growth. Huang Zilun, Director of the Process Enhancement Department at SMIC, stated that SMIC strongly supports the development of locally-based photoresist enterprises and plans to strengthen cooperation with Kehua, providing more information and assistance in terms of application requirements to avoid or reduce detours in photoresist product development. Li Ping, Deputy General Manager of Wuhan Xinxin, reported on the demand for photoresists driven by the company’s 3D NAND business development. He noted that supporting the development of local materials industries and growing together with domestic material manufacturers is a key strategy for the company. He expressed hope that photoresist companies would begin collaborating with manufacturers at the early stages of process development and actively participate in the application phase once mass production starts. Hong Xiaoyin, a senior expert in China’s photoresist community and Professor at Tsinghua University, stressed that photoresists are a strategic national need and should not be pursued solely for economic gain. Instead, systematic top-level design is required, covering basic research, talent cultivation, and industrial development. Participants also engaged in an in-depth and lively discussion on establishing an open and shared platform for photoresist application process development, encouraging manufacturers to use more domestically produced materials, and addressing the issue of localizing key photoresist raw materials.

　　In his speech and summary at the meeting, Chief Engineer Ye Tianchun pointed out that aligning the innovation chain with the industrial chain is the guiding principle for implementing the 02 Special Project and for project deployment. He expressed hope that the implementation of this special project would foster an atmosphere of industrial technological innovation, promote technological development and enhance product quality, and accelerate the advancement of the supply chain. Beijing Kehua has made certain progress in the technological development of 248nm photoresist, a feat worthy of congratulations; however, there is still a gap to go before it can become a competitive flagship enterprise nurtured under the special project. The recent investment by Nanda Optoelectronics in Beijing Kehua is a positive development. We hope that, building on this foundation, Beijing Kehua can engage in effective communication and coordination with all stakeholders in the industry, carefully formulate an implementation plan for the future development of high-end photoresists, and specify concrete measures in areas such as talent cultivation, discipline development, basic applied research, and industrial growth, thereby achieving even greater breakthroughs during the 13th Five-Year Plan period.

　　Following the seminar, a signing ceremony was held for the investment cooperation between Nanjing University Optoelectronics and Beijing Kehua. Nanjing University Optoelectronics’ equity investment in Beijing Kehua exemplifies the Materials Alliance’s long-standing commitment to collaborative innovation and cooperative development, serving as a representative case that guides and promotes cooperation among member companies and the integrated development of the industry. Through this collaboration, the technological and market resources of Beijing Kehua and Nanjing University Optoelectronics in the field of integrated circuit materials will be effectively integrated. Leveraging Nanjing University Optoelectronics’ financing platform and its standardized corporate management experience, the partnership will attract talent from various fields—including technology, management, and marketing—at a broader scope and on a higher level, thereby enhancing Beijing Kehua’s corporate operational capabilities and driving the advancement of China’s high-end photoresist industry toward even more sophisticated technology nodes.