Dr. Lin Qinghuang, a specially appointed consulting expert of the Alliance, has been elected as a Fellow of the SPIE Society for 2017.

In January 2017, Dr. Lin Qinghuang, a specially appointed expert of the Materials and Components Alliance and a researcher at the Thomas J. Watson Research Center of IBM in the United States, was elected as a Fellow of the SPIE Society for 2017. On February 10, 2015, Dr. Lin Qinghuang was officially appointed as a specially appointed advisory expert of the Integrated Circuit Materials and Components Alliance. In 2016, he served as the Vice Chairman of the Advanced Microelectronics and Optoelectronics Materials Division at the 17th Asian Materials Conference, organized by the Alliance. At the same time, he also organized and personally taught the first training workshop on “Integrated Circuit Chip Manufacturing Processes and Integration Technologies,” which received an enthusiastic response from industry professionals.

　　The International Society for Optical and Photonics Engineering (SPIE), founded in 1955, is a renowned, non-profit professional society dedicated to the exchange, collection, dissemination, and application of knowledge in the fields of optics, photonics, optoelectronics, imaging, and image processing. It serves 264,000 members from 166 countries worldwide. Each year, SPIE organizes and sponsors approximately 25 major technical forums, exhibitions, and educational programs, with activities spanning North America, Europe, Asia, and South Africa. Its primary missions include providing members and the international engineering and scientific community with information, educational resources, and services; offering a platform for communication and interaction between the optics and photonics communities and other disciplines; and organizing conferences and educational programs focused on emerging technologies. The digital library published by SPIE and the numerous academic conferences it holds annually provide diverse forms of information that reflect the latest advancements and trends in their respective fields, making them highly valuable academically and an indispensable and widely acclaimed source of intelligence for scientists and engineers working in optics and its applications.

　　The SPIE Fellow is an honor bestowed by the International Society for Optics and Photonics to recognize members who have achieved significant research accomplishments in multidisciplinary fields such as optics, photonics, and imaging technologies, and who have made outstanding contributions to the field of optics, particularly to SPIE. Since the founding of the International Society for Optics and Photonics in 1955, more than 1,000 SPIE members have been elected as Fellows. In 2017, the International Society for Optics and Photonics added 71 new Fellows, among whom Dr. Lin Qinghuang was honorably elected for his distinguished contributions in the areas of lithographic materials and processes for integrated circuit manufacturing.

　　Dr. Lin Qinghuang has been engaged in semiconductor (integrated circuits, chips) research for nearly two decades and is an expert in the semiconductor chip industry. He has participated in or led R&D projects spanning ten generations—from 0.25-micron to 7-nanometer CMOS and DRAM technologies—as well as other exploratory scientific research initiatives. Dr. Lin possesses extensive experience in research, development, engineering, management, and technology strategic decision-making. He holds 75 granted U.S. patents and has approximately 70 additional patent applications pending. He is a recipient of 23 IBM Outstanding Invention Achievement Awards. Dr. Lin has published over 60 academic papers, edited and published six monographs, and contributed to nine collections of conference proceedings. He serves as an associate editor of the international academic journal Journal of Micro/Nanolithography, MEMS, and MOEMS, and as a guest editor of Journal of Materials Research. In 2002, Dr. Lin received the IBM Technical Achievement Award for his invention, development, and implementation of the 248-nanometer double-layer photoresist technology. This technological breakthrough, recognized as one of IBM’s major contributions to the global semiconductor industry over the past four decades, earned him the U.S. National Medal of Technology—the highest U.S. technology award—presented by the President in 2004. The technology invented by Dr. Lin has been widely adopted in the production of cutting-edge chips used in high-end servers and popular mobile phones.

Key words: