The lecture titled “Application of Defect Control & Filtration Technologies in the Semiconductor and High-Tech Industries” was successfully held in Beijing.

On March 8, 2018, the Integrated Circuit Materials and Components Industry Technology Innovation Strategic Alliance (hereinafter referred to as the “Alliance”) jointly organized, with the support of Pall Corporation of the United States, a technical seminar titled “Application of Defect Control & Filtration Technologies in the Semiconductor and High-Tech Industries.” The seminar specially invited Dr. David Huang, Peicheng Huang, a specially appointed expert on the Alliance’s Expert Advisory Committee and Vice President of Pall Corporation of the United States, as the keynote speaker. More than forty representatives from companies including Jiangsu Dena Chemical, Zhejiang Borui, Zhejiang Kaisheng, Youyan Yijin, Sinochem Lantian, Hubei Jingsheng, Hebei University of Technology, Duofluoride, Nanjing University of Science and Technology Optoelectronics, and Beijing Kaiyixin attended the seminar.

　　On March 8, 2018, the Integrated Circuit Materials and Components Industry Technology Innovation Strategic Alliance (hereinafter referred to as the “Alliance”) jointly organized with Pall Corporation of the United States held a technical seminar titled “Application of Defect Control & Filtration Technologies in the Semiconductor and High-Tech Industries.” The seminar specially invited Dr. David Huang, Peicheng Huang, a specially appointed expert on the Alliance’s Expert Advisory Committee and Vice President of Pall Corporation of the United States, to serve as the keynote speaker. More than forty participants from companies including Jiangsu Dena Chemical, Zhejiang Borui, Zhejiang Kaisheng, Youyan Yijin, Sinochem Lantian, Hubei Jingsheng, Hebei University of Technology, Duofluoride, Nanjing University of Science and Technology Optoelectronics, and Beijing Kaiyixin attended the seminar.

　　Speech by Shi Ying, Secretary-General of the Materials and Components Alliance, before the meeting

The instructor and participants engaged in lively interaction.

　　In semiconductor chip manufacturing and flat-panel display fabrication processes, reducing and controlling “defects and contamination” is a challenging technical issue that everyone must confront. The causes of defects and contamination are complex; they not only significantly impact the R&D progress and yield rate of chip manufacturing processes but also pose a major technical challenge for manufacturers providing high-quality materials and equipment to the semiconductor industry. Dr. Huang addressed these industry challenges in depth, drawing on his extensive industry experience. He provided clear and insightful explanations and analyses on topics including market trends and roadmaps for the semiconductor and flat-panel display industries, requirements for defects and contamination, the causes, sources, and classification of defects and contamination, the origins, contamination risks, and control measures related to metal ions, the properties of filter membrane materials and their chemical compatibility, as well as the selection and application of filters. At the end of the lecture, Dr. Huang carefully answered numerous technical questions and clarifications raised by the participants, creating a warm and engaging atmosphere with lively interaction between the lecturer and the attendees.

　　After the class, the participants expressed that they had greatly benefited from it. This technical lecture not only effectively promoted and popularized knowledge about defect control and enhanced awareness of the importance and urgency of filtration technology in high-tech manufacturing, but also played a positive role in broadening their industry-specific knowledge.

Group photo taken at the tech lecture for all participants.

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