Ministry of Science and Technology: High-tech fields of new materials that receive key national support

According to information released on the website of the Ministry of Science and Technology, the key high-tech fields receiving national support include: 1. Electronic Information; 2. Biology and New Pharmaceuticals; 3. Aerospace; 4. New Materials; 5. High-Tech Services; 6. New Energy and Energy Conservation; 7. Resources and Environment; 8. Advanced Manufacturing and Automation. These include technologies for the preparation and application of new semiconductor materials, specifically as follows: graphene preparation and application technologies; technologies for growing large-size silicon single crystals, polishing wafers, manufacturing SOI wafers, and preparing SiGe/Si epitaxial wafers; key supporting materials for large-scale MOCVD systems, epitaxial growth on silicon substrates, and new material preparation technologies for OLED lighting; large-size gallium arsenide substrates and polished surfaces.

According to information released on the website of the Ministry of Science and Technology, the high-tech fields that receive key national support are:

I. Electronic Information

II. Biology and New Pharmaceuticals

III. Aerospace

IV. New Materials

V. High-tech Services

VI. New Energy and Energy Conservation

VII. Resources and Environment

8. Advanced Manufacturing and Automation

These include new semiconductor materials preparation and application technologies, as detailed below:

Graphene preparation and application technologies; large-size silicon single-crystal growth, wafer polishing, SOI piece and SiGe/Si Epitaxial wafer preparation and processing technology; large-scale MOCVD Key supporting materials, silicon substrate epitaxy, and OLED New material preparation technologies for lighting; large-size gallium arsenide substrates, polished wafers, and epitaxial wafers. GaAs/Si Materials preparation technologies; technologies for preparing infrared germanium single crystals, wide-bandgap single crystals, and epitaxial materials; technologies for preparing third-generation wide-bandgap semiconductor materials; large-scale continuous processes for the distillation and zone-melting purification of high-purity metals—including gallium, indium, arsenic, germanium, phosphorus, and cadmium—as well as semiconductor-grade materials; technologies for refining and purifying high-purity and ultra-high-purity non-ferrous metal materials, along with trace impurity testing technologies; and technologies for large-scale production of high-purity electronic-grade polycrystalline silicon via low-pollution silane-based methods, including post-processing and zone-melting.

* Excluding the preparation and processing technologies for single-crystal and polycrystalline silicon used in solar cells, which are characterized by high pollution, high energy consumption, and low photoelectric conversion efficiency.

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