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Aluminum etching solution
Hubei Xingfu Electronic Materials Co., Ltd
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Aluminum etching solution is composed of several acids mixed according to different ratios, which is the key material of wet etching process to remove Mo Al metal layer on thin film by chemical reaction. Metal ions < 100 ppb.
Hubei Xingfu Electronic Materials Co., Ltd
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Sulfuric acid (H2SO4, 96% concentration)
Tetramethylammonium hydroxide (TMAH, 25% concentration)
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