As the semiconductor process node continues to evolve, the cleanliness requirements of the wafer surface are becoming more and more stringent. Micro-polluting impurities on the wafer surface are a key factor affecting chip yield and chip product performance. In order to cope with the new challenges and new demands for micro-pollution control raised by high-end processes, on November 19, the Integrated Circuit Material Industry Technology Innovation Alliance (hereinafter referred to as "ICMtia") and Cobetter Filter Equipment Co., Ltd. (hereinafter referred to as "Cobetter") the integrated circuit ultra-clean process technology workshop was successfully held in Xiaoshan District, Hangzhou.
The conference took the form of simultaneous online and offline operations. A total of senior officials, technicians, and academics from the upstream and downstream companies in the industrial chain such as integrated circuit manufacturing, silicon materials, process chemicals, photoresist, CMP materials, etc. More than 80 people attended the meeting.
Shiying Ni, Deputy District Mayor of Xiaoshan District, Hangzhou, first gave a speech, congratulating the successful convening of this Workshop and expressing Xiaoshan District’s determination to support the development of the integrated circuit industry.
Secretary-General of ICMtia Ying Shi gave a live speech.
Yingmin Zhang, founder and CEO of Cobetter, and Wenjie Yu, chairman of Shanghai Institute of Integrated Circuit Materials, delivered speeches successively.
The meeting specially invited Peng Sun, the chief operating officer of XMC, Fang Li, an expert in wet research and development of advanced modules of Shanghai Huali Integrated Circuit Manufacturing Co., Ltd., and the application director of Anji Microelectronics Technology (Shanghai) Co., Ltd. Shengli Wang and Yamada Yoshiaki, CTO of Hangzhou Cobetter gave wonderful reports.
In the afternoon, the participating technical experts visited the 100-level clean workshop of Cobetter semiconductor filter elements, the 7000-square-meter technical verification center, the 200L ultra-clean packaging barrel and the manufacturing workshop of high-purity chemical lining equipment. A close and intuitive understanding of culture, production process and quality control system has played a positive role in future technological and industrial cooperation.
After that, Chongying Xu, an expert from the Advisory Committee of ICMtia and the general manager of Ningbo Nata Optoelectronic Materials Co., Ltd., presided over the technical exchange meeting. Participants discussed the challenges of micro-pollution control in advanced semiconductor manufacturing processes. Experts in process chemicals and photoresist technology shared the current status of materials and urgent problems that need to be overcome, including the purification of TMAH and the packaging of high-purity chemicals. Containers have attracted much attention. Participants expressed that this Workshop is a very effective organization method for discussing the micro-pollution problems encountered in the application side and the production of various materials and their solutions.
