On December 16, 2020, the Standards Committee of the Integrated Circuit Material Industry Technology Innovation Alliance (hereinafter referred to as "ICMtia") held a group standard review meeting in Ningbo.
The meeting was presided over by Liu Bing, director of the ICMtia Standards Committee. Experts from the review team and some leaders and engineers from related units attended the meeting. The meeting reviewed the "ArF Dry Photoresist for Integrated Circuits", "ArF Immersion Photoresist for Integrated Circuits" and "Photolithography of ArF Photoresist for Integrated Circuits" drafted by Ningbo Nanda Optoelectronic Materials Co., Ltd. under the jurisdiction of ICMTtia. Detection Methods" and "ArF Photoresist Monomers for Integrated Circuits Part 1: Liquid Methacrylates" drafted by Xuzhou Bokang Information Chemicals Co., Ltd. and "ArF Photoresist Monomers for Integrated Circuits Part 1: "Solid methacrylates" five group standards are submitted for review.
After the review team’s experts listened to the report of the standard preparation team, they reviewed relevant materials, and conducted strict and detailed review and discussion on the standard drafts for review item by item, and put forward many feasible amendments.
The entire review process strictly followed the ICMtia Standards Committee’s "Standard Setting Procedure". The final review team voted to pass "ArF Dry Photoresist for Integrated Circuits", "ArF Immersion Photoresist for Integrated Circuits" and "ArF Photoresist for Integrated Circuits". Photolithography Detection Method of Resist" and "ArF Photoresist Monomers for Integrated Circuits Part 1: Liquid Methacrylates", "ArF Photoresist Monomers for Integrated Circuits Part 1: Solid Methacrylates" "Class" for review and approval of the draft, and it is recommended that the preparation team modify it according to the review team’s comments and form a standard draft for approval.
