There are 5,583 patents for the development of global photoresists, of which 3,726 are patents for photoresists. The specific classification of these patents and the proportion of patents are shown in the above figure. At present, the photoresist resin patent G, I line, 248nm, 193nm, DUV, immersion 193nm photoresist accounted for 88% of the resin patent, of which DUV refers to both 248nm photoresist and 193nm photoresist. The patented resin, immersion 193nm refers to the patented resin for immersion 193nm photoresist. At present, the largest photoresist in the industry is mainly G, I line photoresist, 248nm photoresist, 193nm photoresist.
The Materials and Components Alliance conducted a systematic and in-depth analysis of global photoresist patents, including a global patent for photoresist development; comparison of photoresist patents in six regions of Europe, the United States, Japan, Korea, China, and Taiwan; Photographic analysis of photoresists; deep analysis of patent status of the world's top ten photoresist companies; analysis of patent status of Chinese photoresists. The research report focuses on the global patent application volume, patent application trend, patent law status, patent distribution area, patent holder distribution, patentee citation status, patent core concept, patent map, technical field classification table, core patent, patent right. People apply for patents, and the technical position of top patent holders.
The "Global Photoresist Industry Patent Analysis Report" has a total of 468 pages, 459 charts, and can be attached to the full text of 5,48 photoresist patents. Enterprises and institutions engaged in research and development, production and investment of photoresists provide valuable reference information in strategy formulation, technology positioning and product development. If necessary, please contact Wang Yanmei 010-82357517/18701286298