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Introduction to Global Photoresist Patent Analysis Report (4)

Introduction to Global Photoresist Patent Analysis Report (4)

Source:
2016/08/18
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The global photoresist patents ranked in the top ten patent holders according to the effective patent ownership, as shown in the following figure, followed by Tokyo Tokyo, Japan Shin-Etsu Chemical, Dow Chemical, Sumitomo Chemical, Fujifilm, and Aichi Electronics , Japan's synthetic rubber, South Korea's Dongjin Shimeiken, the United States IBM, South Korea's Samsung Electronics. Among them, there are 5 Japanese companies, 3 American companies, and 2 Korean companies. There are great differences in the number of patent applications, legal status, open country status, and especially technical expertise of each company.

 

 

The Materials and Components Alliance conducted a systematic and in-depth analysis of global photoresist patents, including a global patent for photoresist development; comparison of photoresist patents in six regions of Europe, the United States, Japan, Korea, China, and Taiwan; Photographic analysis of photoresists; deep analysis of patent status of the world's top ten photoresist companies; analysis of patent status of Chinese photoresists. The research report focuses on the global patent application volume, patent application trend, patent law status, patent distribution area, patent holder distribution, patentee citation status, patent core concept, patent map, technical field classification table, core patent, patent right. People apply for patents, and the technical position of top patent holders.

 

The "Global Photoresist Industry Patent Analysis Report" has a total of 468 pages, 459 charts, and can be attached to the full text of 5,48 photoresist patents. Enterprises and institutions engaged in research and development, production and investment of photoresists provide valuable reference information in strategy formulation, technology positioning and product development. If necessary, please contact Wang Yanmei 010-82357517/18701286298