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Introduction to Global Photoresist Patent Analysis Report (2019)

Introduction to Global Photoresist Patent Analysis Report (2019)

Source:
2019/06/03
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Photoresist is the core material of the photolithography process of integrated circuit manufacturing, and is the integrated circuit material supported by the state. The mastery of the global layout of photoresist development patents will greatly help the development of China's photoresist industry. The "Global Photoresist Patent Analysis Report (2019)" is based on a world-renowned patent search and analysis system, which conducts a comprehensive search of related patents that developed by the global photoresist from the earliest search year 1782 to May 2019 and conducted a detailed and in-depth analysis. The analysis is carried out from the following five aspects: analysis of global photoresist development patents; comparison of the general situation of photoresist development patents in Europe, the United States, Japan, South Korea, China, and Taiwan; photoresist Analysis of different types of patent status; in-depth analysis of patent status of the top ten photoresist development companies in the world; analysis of patent status of Chinese photoresist. In the analysis, nearly 20 metrics have been introduced to give a comprehensive analysis, including the number of patent applications, patent application trends, patent legal status, patent distribution area, distribution of patent owners, patent owner citation status, patent IPC classification application trends, patent core concepts, patent maps, technical field classification tables, core patent analysis, patent holders ’total patent applications, top-level patent holders’ technical positioning, and patent classification tables, revealing some valuable information in this technical field and further elaborating the core technology in the field of photoresist. And it also analyzes the general situation of China's photoresist development patents and the gap with foreign countries, and puts forward suggestions on the global layout of China's photoresist patents.
"Global Photoresist Industry Patent Analysis Report" has a total of 974 pages, a total of 274 pictures, a total of 106 tables, and 8065 pieces of photoresist patents attached. It provides valuable reference information for enterprises and institutions engaged in R & D, production and investment of photoresist in strategic formulation, technical positioning and product development.
If necessary, please contact: Yanmei Wang 010-82357517 / 18701286298

Report Directory
Chapter 1 Introduction 8
Chapter 2 Explanation of Patent Search and Analysis Methods for Photoresist Development 12
2.1 Database selection 12
2.2 Patent search analysis method 12
Chapter III Analysis of the overall situation of global photoresist development patents 13
3.1 Analysis of the total number of photoresist patent applications 13
3.2 Trend analysis of photoresist patent applications 13
3.3 Analysis of the legal status of photoresist patents 14
3.4 Analysis of photoresist patent distribution area 16
3.5 Analysis of the distribution of patent owners 17
3.6 Analysis of citation status of patent owners 19
3.7 Overall in-depth analysis of patent technology background 21
3.7.1 Classification of technical fields 21
3.7.2 Analysis of ORBIT system technology area 22
3.7.3 Technology Positioning of Top Participants 23
3.7.4 Patent Map 26
3.8 Summary of Global Patent Development of Photoresist 28
Chapter 4 Comparison of Patent Status in Europe, America, Japan, Korea, China and Taiwan 29
4.1 Comparison of the total number of photoresist patent applications 29
4.2 Comparison of patent application trends for photoresist development 29
4.3 Comparison and Analysis of the Legal Status of Photoresist Patent 32
4.4 Comparison of distribution of photoresist patent disclosure countries 35
4.5 Analysis of photoresist patent owners and their patent citation status 46
4.6 Comparison of overall in-depth analysis of patent technology background 54
4.6.1 Patent Classification Table 55
4.6.2 The distribution of IPC classification with the year of application 62
4.6.3 Technology Positioning of Top Patent Owners 69
4.6.4 Patent Map 72
4.7 Comparison of Patent Status in China, the United States, Japan, Europe, South Korea and Taiwan 77
Chapter V Analysis of Patent Status of Photoresist Classification 79
5.1 Patent analysis of G, I line, ultraviolet broad-spectrum photoresist 79
5.1.1 Analysis of the total number of photoresist patent applications 79
5.1.2 Analysis of patent application trends 79
5.1.3 Analysis of patent legal status 80
5.1.4 Analysis of patent distribution area 82
5.1.5 Distribution Analysis of Patent Owners 84
5.1.6 Overall depth analysis of the patented technical background of broad-spectrum ultraviolet, G-line and I-line 86
5.1.7 Summary of ultraviolet broad-spectrum, G-line, and I-line technologies and prediction of development trends 110
5.2 Patent Analysis of 248nm Photoresist 111
5.2.1 Analysis of the total number of photoresist patent applications 111
5.2.2 Analysis of patent application trends 113
5.2.3 Analysis of patent legal status 114
5.2.4 Analysis of patent distribution area 116
5.2.5 Distribution analysis of patentees 118
5.2.6 Overall depth analysis of 248nm patent technology background 120
5.2.7 248nm photoresist technology summary and development trend prediction 219
5.3 Patent Analysis of 193nm Photoresist 221
5.3.1 Analysis of the total number of photoresist patent applications 221
5.3.2 Analysis of patent application trends 222
5.3.3 Analysis of the legal status of patents
5.3.4 Analysis of patent distribution area 225
5.3.5 Distribution Analysis of Patent Owners
5.3.6 Overall depth analysis of 193nm patent technology background 230
5.3.7 193nm photoresist technology summary and development trend prediction 344
5.4 Anti-reflective film for photoresist matching 346
5.4.1 Analysis of the total number of patent applications for anti-reflective films for photoresist matching 346
5.4.2 Analysis of patent application trends
5.4.3 Analysis of the legal status of patents
5.4.4 Analysis of patent distribution area 350
5.4.5 Analysis of the distribution of patentees 352
5.4.6 Patented anti-reflective film supporting technology background overall depth analysis 354
5.4.7 Summary and development trend prediction of anti-reflective film technology for photoresist matching
Chapter 6 In-depth analysis of the patent status of the top ten photoresist development companies in the world 391
6.1 Tokyo Application Chemical Industry Co., Ltd. (TOK, TOKYO OHKA KOGYO) 391
6.1.1 Analysis of the total number of photoresist patent applications 391
6.1.2 Analysis of photoresist patent application trends 391
6.1.3 Analysis of the legal status of photoresist patents 392
6.1.4 Analysis of the distribution area of photoresist patents
6.1.5 Overall depth analysis of photoresist patent technology background 396
6.1.6 Analysis of core patents of photoresist 398
6.1.7 Summary of TOK's photoresist patents 442
6.2 Shin-Etsu Chemical Co., Ltd. 443
6.2.1 Analysis of the total number of photoresist patent applications 443
6.2.2 Analysis of the trend of photoresist patent applications 443
6.2.3 Analysis of the legal status of photoresist patents 444
6.2.4 Analysis of photoresist patent distribution area 446
6.2.5 Overall depth analysis of photoresist patent technology background 448
6.2.6 Analysis of core patents of photoresist 450
6.2.7 Shin-Etsu Chemical Industry Co., Ltd. photoresist patent situation summary 500
6.3 Dow Chemical Company 500
6.3.1 Analysis of the total number of photoresist patent applications 500
6.3.2 Analysis of trends in photoresist patent applications 501
6.3.3 Analysis of the legal status of photoresist patents
6.3.4 Analysis of photoresist patent distribution area 504
6.3.5 Overall depth analysis of photoresist patent technology background 506
6.3.6 Analysis of core patents of photoresist
6.3.7 Summary of Dow Chemical Resist Patent Patents 538
6.4 Sumitomo Chemical Industry Co., Ltd. (Sumitomo Chemical CO. LTD) 538
6.4.1 Analysis of the total number of photoresist patent applications 538
6.4.2 Analysis of photoresist patent application trends 539
6.4.3 Analysis of the legal status of photoresist patents
6.4.4 Analysis of photoresist patent distribution area 542
6.4.5 Overall depth analysis of photoresist patent technology background 544
6.4.6 Analysis of core patents of photoresist
6.4.7 Sumitomo Chemical Co., Ltd. Photoresist Patent Summary 596
6.5 Fujifilm CO. LTD 597
6.5.1 Analysis of the total number of photoresist patent applications 597
6.5.2 Analysis of the trend of photoresist patent applications
6.5.3 Analysis of the legal status of photoresist patents
6.5.4 Analysis of photoresist patent distribution area 601
6.5.5 Overall depth analysis of photoresist patent technology background 602
6.5.6 Analysis of Core Patent of Photoresist 605
6.5.7 Fujifilm Co., Ltd. Photoresist Patent Summary 639
6.6 AZ ELECTRONIC MATERIAL 640
6.6.1 Analysis of the total number of photoresist patent applications 640
6.6.2 Analysis of photoresist patent application trends 640
6.6.3 Analysis of the legal status of photoresist patents
6.6.4 Analysis of photoresist patent distribution area 643
6.6.5 Overall depth analysis of photoresist patent technology background 645
6.6.6 Analysis of core patents for photoresist 647
6.6.7 Anzhi Electronic Materials Company's photoresist patent situation summary 667
6.7 Japan Synthetic Rubber Co. Ltd (JSR) 668
6.7.1 Analysis of the total number of photoresist patent applications 668
6.7.2 Analysis of the trend of photoresist patent applications 668
6.7.3 Analysis of the legal status of photoresist patents
6.7.4 Analysis of photoresist patent distribution area 672
6.7.5 Overall depth analysis of photoresist patent technology background 673
6.7.6 Analysis of Core Patent of Photoresist 676
6.7.7 Japan Synthetic Rubber Company's photoresist patent summary 712
6.8 DONGJIN SEMICHEM CO. LTD 712
6.8.1 Analysis of the total number of photoresist patent applications 712
6.8.2 Analysis of photoresist patent application trends 713
6.8.3 Analysis of the legal status of photoresist patents 714
6.8.4 Analysis of photoresist patent distribution area 716
6.8.5 Overall depth analysis of photoresist patent technology background 718
6.8.6 Analysis of core patents of photoresist 720
6.8.7 South Korea Dongjin World Micron's patent situation summary 740
6.9 American International Business Machines Corporation (IBM) 741
6.9.1 Analysis of the total number of photoresist patent applications 741
6.9.2 Analysis of the trend of photoresist patent applications 741
6.9.3 Analysis of the legal status of photoresist patents
6.9.4 Analysis of the distribution area of photoresist patents
6.9.5 Overall depth analysis of photoresist patent technology background 747
6.9.6 Analysis of core patents of photoresist 749
6.9.7 Summary of Photoresist Patent Status of IBM Corporation
6.10 South Korea Samsung Electronics (SUMSUNG) 759
6.10.1 Analysis of the total number of photoresist patent applications 759
6.10.2 Analysis of the trend of photoresist patent applications 759
6.10.3 Analysis of the legal status of photoresist patents 760
6.10.4 Analysis of Distribution Area of Photoresist Patent 762
6.10.5 Overall depth analysis of photoresist patent technology background 764
6.10.6 Analysis of Core Patent of Photoresist 766
6.10.7 Summary of SUMSUNG's photoresist patents 785
Chapter VII Analysis of Patent Status of China's Photoresist Development 786
7.1 Analysis of the total number of photoresist patent applications in China 787
7.2 Analysis of China's photoresist patent application trends 787
7.3 Analysis of the legal status of China's photoresist patents
7.4 Analysis of the distribution of patentees 792
7.5 Overall In-depth Analysis of Patent Technology Background 794
7.5.1 Technical Areas
7.5.2 Change trend of IPC classification according to public years 795
7.5.3 Technology Positioning of the Top 30 Patent Owners 796
7.5.4 Citation relationship of patentee 799
7.5.5 Key technical indicators
7.5.6 Patent Map 960
7.6 Summary of China's Photoresist Development Patent 961
Chapter 8 Prediction of Technology Development Trend of Photoresist Industry 963
Chapter 9 The Influence of the General Situation of the Development of Intellectual Property of Photoresist on the Industrial Structure and Competition Situation 968
Chapter 10 Suggestions on the Overall Layout of China's Photoresist Patents 973