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The technical seminar on "Application of Defect Control & Advanced Filtration Technology in the Semiconductor Industry" was succ

The technical seminar on "Application of Defect Control & Advanced Filtration Technology in the Semiconductor Industry" was succ

Source:
2018/06/14
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On June 14, 2018, the themed technical seminar organized by the Integrated Circuit Materials & Components Industry Technology Innovative Alliance (hereinafter referred to as the “Alliance”) - "Defect Control & Advanced Filtration Technology in the Semiconductor Industry" (Phase II) was successfully held in Beijing. This seminar specially invited Dr. Huang Piheng, special expert of the Expert Advisory Committee of the Alliance and Vice President of Pall Company of the United States, as a lecturer. More than 20 people from the companies and research institutes including Guangdong Xiandao Rare Materials Co., Ltd., Credit Chemical Technology Development Co., Ltd. from Dalian Free Trade Zone, Guangdong Huate Gas Co., Ltd., Guizhou Wylton Jinglin Electronic Materials Co., Ltd., Linggas (Tianjin) Limited, Tianjin Hwatsing Technology Company Limited, Tsinghua University, Hubei Dinglong Co., Ltd., etc. attended the seminar.

 

北京多维电子材料技术开发与促进中心

 

Secretary of the Materials and Components Alliance Shi Jie talks before the meeting

 

北京多维电子材料技术开发与促进中心

 

The lecturer Dr.huang interacted enthusiastically with the students.

 

In the semiconductor chip manufacturing and flat panel display manufacturing process, how to reduce and control "defects and pollution" is a difficult technical problem that everyone must face. The complex causes of defects and pollution not only have a major impact on the development process and rate of finished products of the chip manufacturing process, but also bring a major technical challenge to manufacturers providing high quality materials and equipment for the semiconductor industry. In response to the above-mentioned industry difficulties and combined with his rich industry experience, Dr. Huang made an explanation and analysis to the market trend of semiconductor, roadmap of manufacturing industry, defect control and yield improvement, lithography & etching cleanliness requirements for defects and pollution, gas filtration and purification requirements, material properties of the filtration membrane, compatibility of the medium and chemical materials, and selection and application of the filter. At the end of the seminar, Dr. Huang also shared his own experience to solve the puzzles and questions encountered by the students. The atmosphere was harmonious, and the interaction between the lecturer and the students was warm.

After the class, the students benefited a lot. This technical seminar not only effectively popularized the knowledge of defect control, but also improved the understanding of the importance and urgency of filtration technology in the semiconductor industry. It also played a positive effect in broadening the knowledge of the industry.

 

北京多维电子材料技术开发与促进中心

 

Technical lectures